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A. A. Lebedev
Researcher at Russian Academy of Sciences
Publications - 231
Citations - 1660
A. A. Lebedev is an academic researcher from Russian Academy of Sciences. The author has contributed to research in topics: Irradiation & Silicon carbide. The author has an hindex of 17, co-authored 226 publications receiving 1568 citations. Previous affiliations of A. A. Lebedev include Foundation for Research & Technology – Hellas & Saint Petersburg State University of Information Technologies, Mechanics and Optics.
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Deep level centers in silicon carbide: A review
TL;DR: In this paper, the authors analyzed the effect of intrinsic defects in the SiC crystal lattice both on the formation of deep centers and on the properties of the epitaxial layers themselves, such as their doping level and polytype homogeneity.
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Doping of n-type 6H–SiC and 4H–SiC with defects created with a proton beam
A. A. Lebedev,A. I. Veinger,Denis Davydov,Vitalii V. Kozlovski,N.S. Savkina,Anatoly M. Strel'chuk +5 more
TL;DR: In this article, the authors showed that irradiation of wideband gap semiconductors may lead to an increase in the concentration of uncompensated donors in an n-type material.
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Wide-gap semiconductors for high-power electronics
A. A. Lebedev,V. E. Chelnokov +1 more
TL;DR: The latest results obtained in the development of high-power devices based on wide-gap semiconductors are examined in this paper, where it is shown that at present silicon carbide remains the most promising material for high-temperature, radiation-resistant, high power electronics.
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Low-doped 6H-SiC n-type epilayers grown by sublimation epitaxy
N.S. Savkina,A. A. Lebedev,Denis Davydov,Anatoly M. Strel'chuk,A. S. Tregubova,Christophe Raynaud,Jean-Pierre Chante,Marie-Laure Locatelli,Dominique Planson,J. Milan,Phillippe Godignon,F.J. Campos,Narcis Mestres,J. Pascual,Gheorghe Brezeanu,Marian Badila +15 more
TL;DR: In this paper, an optimized technology of sublimation epitaxial growth was used to obtain structurally perfect 6H-SiC layers with a concentration of uncompensated donors as low as 10(15) cm(-3).
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Study of the crystal and electronic structure of graphene films grown on 6H-SiC (0001)
V. Yu. Davydov,V. Yu. Davydov,D. Yu. Usachov,Sergey P. Lebedev,Alexander N. Smirnov,Alexander N. Smirnov,V. S. Levitskii,I. A. Eliseyev,I. A. Eliseyev,Prokhor A. Alekseev,Mikhail S. Dunaevskiy,O. Yu. Vilkov,Artem G. Rybkin,A. A. Lebedev +13 more
TL;DR: In this paper, the structural, chemical, and electronic properties of epitaxial graphene films grown by thermal decomposition of the Si-face of a semi-insulating 6H-SiC substrate in an argon environment are studied by Raman spectroscopy, atomic-force microscopy, the low-energy electron diffraction method, X-ray photoelectron spectrography, angle-resolved photoemission spectrogram, and Xray absorption spectrograms at the carbon K edge.