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Patent

Mask inspection apparatus and mask inspection method

Kurita Shuichi
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TLDR
In this article, a mask inspection apparatus was proposed to perform mask defect inspection with high accuracy by quantitatively judging a stripe defect caused in a mask by acquiring the light transmitted or reflected by a mask having a predetermined pattern formed thereon.
Abstract: 
PROBLEM TO BE SOLVED: To perform mask defect inspection with high accuracy by quantitatively judging a stripe defect caused in a mask. SOLUTION: A mask inspection apparatus 1 inspects a defect in a mask M by acquiring the light transmitted or reflected by a mask M having a predetermined pattern formed thereon, wherein the apparatus is equipped with: a light source 11 which irradiates the mask M with light at a wavelength longer than the minimum line width of the pattern in the mask M; a line sensor 12 which acquire transmitted light or reflected light by the mask M of the light emitting from the light source 11; and an operating unit 13 which obtains the intensity of the transmitted light or reflected light acquired by the line sensor 12 for each cell prepared by dividing the inspection region of the mask M into a matrix state, and performs calculation using the intensity of each cell. COPYRIGHT: (C)2006,JPO&NCIPI

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Patent

Using reflected and transmission maps to detect reticle degradation

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Carl Hess, +2 more
TL;DR: In this paper, an inspection tool is used to obtain a plurality of patch area images of each patch area of each die of a set of identical dies on a reticle, which are then determined to form a difference intensity map of the reticle.
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