Journal ArticleDOI
Materials Processing Using an Atmospheric Pressure, RF-Generated Plasma Source
TLDR
In this article, the authors describe several variations of this unique plasma source and some of its potential applications, including high pressure and low temperature plasma processes with high selectivity, minimal ion densities, and low surface damage.Abstract:
Processing materials at atmospheric pressure provides clear advantages over traditional, vacuum-based plasma processing: in addition to reduction in the capital cost of equipment and the elimination of constraints imposed by vacuum-compatibility, high pressure and low temperature plasma processes offer unprecedented improvements for generation of active chemical species, high chemical selectivity, minimal ion densities resulting in low surface damage and surface treatment methods unattainable by other means. We describe several variations of this unique plasma source and some of its potential applications.read more
Citations
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Physics of plasmas
TL;DR: In this article, the Equations of Gas Dynamics and Magnetoplasmas Dynamics were studied, as well as Magnetoplasma Stability and Transport in Magnetplasmas and Magnetic Stability.
Journal ArticleDOI
High-speed photographs of a dielectric barrier atmospheric pressure plasma jet
TL;DR: In this article, the propagation of an atmospheric pressure plasma jet (APPJ) was investigated by using an intensified charge coupled device (ICCD) camera and it was shown that the APPJ is mainly an electrical phenomenon and not a flow related one.
Journal ArticleDOI
Atmospheric pressure plasma jets: an overview of devices and new directions
TL;DR: Atmospheric pressure plasma jets have a long history of more than 50 years as discussed by the authors and during this time their design and plasma generation mechanism has been developed and adapted to various fields of applications.
Journal ArticleDOI
Absolute atomic oxygen density measurements by two-photon absorption laser-induced fluorescence spectroscopy in an RF-excited atmospheric pressure plasma jet
TL;DR: In this paper, absolute atomic oxygen density measurements by two-photon absorption laser-induced fluorescence (TALIF) spectroscopy in the jet effluent were performed with the aid of a comparative TALIF measurement with xenon.
Journal ArticleDOI
Antimicrobial treatment of heat sensitive products by miniaturized atmospheric pressure plasma jets (APPJs)
Klaus-Dieter Weltmann,Ronny Brandenburg,T. von Woedtke,Jörg Ehlbeck,R. Foest,M. Stieber,E. Kindel +6 more
TL;DR: In this paper, the applicability of plasma-based processes for the antimicrobial treatment on selected heat sensitive products is demonstrated, using modular, selective and miniaturized plasma sources, which are driven at atmospheric pressure and adaptable to the products to be treated.
References
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Principles of Plasma Discharges and Materials Processing
TL;DR: In this paper, the authors introduce the concept of particle and energy balance in discharges and introduce the theory of collision dynamics and wave-heated discharges, as well as chemical reactions and equilibrium.
Book
Physics of plasmas
TL;DR: In this article, the Equations of Gas Dynamics and Magnetoplasmas Dynamics were studied, as well as Magnetoplasma Stability and Transport in Magnetplasmas and Magnetic Stability.
Journal ArticleDOI
Decontamination of chemical and biological warfare (CBW) agents using an atmospheric pressure plasma jet (APPJ)
TL;DR: Schutze et al. as discussed by the authors described the atmospheric pressure plasma jet (APPJ) as a nonthermal, high pressure, uniform glow plasma discharge that produces a high velocity effluent stream of highly reactive chemical species.
Journal ArticleDOI
Discharge phenomena of an atmospheric pressure radio-frequency capacitive plasma source
TL;DR: In this paper, an atmospheric pressure plasma jet (APPJ) operates using rf power and produces a stable homogeneous discharge at atmospheric pressure, which is divided into two regimes, a "normal" operating mode when the discharge is stable and homogeneous, and a "failure" mode when it converts into a filamentary arc.
Journal ArticleDOI
Etching materials with an atmospheric-pressure plasma jet
TL;DR: In this paper, a plasma jet was developed for etching materials at atmospheric pressure and between 100 and C. Gas mixtures containing helium, oxygen and carbon tetrafluoride were passed between an outer, grounded electrode and a centre electrode, which was driven by 13.56 MHz radio frequency power at 50 to 500 W. At a flow rate of, a stable, arc-free discharge was produced.