Patent
Oxime sulfonate compound and acid generating agent for resist
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TLDR
In this paper, the problem of obtaining a new oxime sulfonate useful as an acid generating agent for resist capable of providing a resist pattern high in generation efficiency of an acid, excellent in pattern shape, dimensional fidelity, exposure margin, heat resistance etc.Abstract:
PROBLEM TO BE SOLVED: To obtain a new oxime sulfonate useful as an acid generating agent for resist capable of providing a resist pattern high in generation efficiency of an acid, excellent in pattern shape, dimensional fidelity, exposure margin, heat resistance, etc. SOLUTION: This oxime sulfonate compound is shown by formula I [R 1 and R 2 are each a (substituted) hydrocarbon] such as a compound of formula III. The compound of formula II is obtained, for example, by esterifying an oxime group-containing compound with a sulfonic acid chloride group-containing compound in a solvent such as tetrahydrofuran in the presence of a basic catalyst such as pyridine. An acid generating agent comprising the compound of formula I is mixed with a film-forming substance to prepare a photosensitive composition for resist. The amount of the photosensitive composition for resist blended is preferably about 1-30 pts.wt. based on 100 pts.wt. of the film-forming substance. COPYRIGHT: (C)1997,JPOread more
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