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Proceedings ArticleDOI

Study on Retention and Chemical States of Implanted Deuterium Into Boron Thin Film

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The article was published on 2003-06-01. It has received 1 citations till now. The article focuses on the topics: Boron & Chemical state.

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Journal Article

Reduction of Hydrogen Content in Boron Film by Controlling Glow Discharge Conditions

TL;DR: In this paper, the hydrogen content in boron films produced with DC glow discharge was first investigated at room temperature in plasma processing teststand (PPT) by measuring dependences on B 10 H 14 flow rate, mixing ratio in helium, discharge power, and total pressure.
References
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Journal ArticleDOI

XPS study of the process of oxygen gettering by thin films of PACVD boron

TL;DR: In this article, it was found that the state of the samples after boronization is the most reliable predictor of subsequent machine performance, while the oxide always remains substoichiometric.
Journal ArticleDOI

Oxidation behaviour of boron carbide

TL;DR: In this paper, the oxidation behavior of various boron-carbide samples have been studied by photoelectron spectroscopy, and the highest reactivity against oxidation was obtained during the growth of a BCR surface phase which revealed a marked oxygen gettering effect.
Journal ArticleDOI

Properties of a-C/B : H films relevant to plasma—surface interactions

TL;DR: In this article, thin boron doped carbonaceous films have been deposited on metal alloys (stainless steel, Inconel), graphite and silicon single crystals during the boroneization procedures in TEXTOR, they show a very good adhesion to all the substrates investigated, they are hard, semitransparent, amorphous and homogeneous down to about 3 nm.
Journal ArticleDOI

Reduction of hydrogen content in boron film by controlling glow discharge conditions

TL;DR: In this article, the hydrogen content in boron films produced with DC glow discharge was first investigated at room temperature in plasma processing teststand (PPT) by measuring dependences on B 10 H 14 flow rate, mixing ratio in helium, discharge power, and total pressure.
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