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How to make 13.5 nm light source ?

Extreme ultraviolet lithography

Yttrium aluminium garnet

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To create a 13.5 nm light source for extreme ultraviolet lithography (EUVL), laser-produced plasma emission from Sn V–Sn XIV ions is a proposed solution . Another approach is cavity-enhanced high-harmonic generation using a pierced cavity mirror for outcoupling, which has the potential for advances in precision extreme-ultraviolet spectroscopy and attosecond physics . A proof-of-principle experiment demonstrated the optimization of a Li-based microjet target coupled to dual subpicosecond laser pulses as a 13.5 nm soft x-ray emission source . Quasi-phase-matched high-harmonic generation has also been shown to produce beams with high spatial coherence at 13 nm, making it a practical, small-scale, coherent, extreme-ultraviolet source for metrology, imaging, and microscopy . The use of tin in laser-produced plasmas has shown promise for EUVL, and accurate photoabsorption cross sections are required for optimizing source operation .

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Journal Article•DOI XUV sources: 13-nm XUV pulses from a cavity Martin E. Fermann, Kevin F. Lee - Show less +1 more 01 Aug 2013-Nature Photonics	The provided paper does not mention how to specifically make a 13.5 nm light source. The paper discusses extending cavity-enhanced high-harmonic generation to the ∼10 nm wavelength range using a pierced cavity mirror for outcoupling.
Open access•Journal Article•DOI Highly coherent light at 13 nm generated by use of quasi-phase-matched high-harmonic generation. Xiaoshi Zhang, Ariel R. Libertun, Ariel Paul, Etienne Gagnon, Sterling Backus, Ivan P. Christov, Margaret M. Murnane, Henry C. Kapteyn, Randy A. Bartels, Youjian Liu, David Attwood - Show less +10 more 15 Jun 2004-Optics Letters 53 Citations	The provided paper does not provide information on how to make a 13.5 nm light source. The paper discusses the generation of highly coherent light at wavelengths around 13 nm using quasi-phase-matched high-harmonic generation.
Journal Article•DOI Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma Takeshi Higashiguchi, Chirag Rajyaguru, Shoichi Kubodera, Wataru Sasaki, Noboru Yugami, Takashi Kikuchi, Shigeo Kawata, Alex Andreev - Show less +7 more 03 Jun 2005-Applied Physics Letters 13 Citations	The paper discusses a proof-of-principle experiment using a Li-based microjet target and dual subpicosecond laser pulses to optimize a 13.5 nm soft x-ray emission source.
Journal Article•DOI Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography J. White, G O'Sullivan, S. V. Zakharov, Peter Choi, V. S. Zakharov, Hiroaki Nishimura, Shinsuke Fujioka, Katsunobu Nishihara - Show less +7 more 14 Apr 2008-Applied Physics Letters 25 Citations	The paper discusses the use of laser-produced plasma emission from Sn V-Sn XIV ions as a proposed solution for creating a 13.5 nm light source for extreme ultraviolet lithography. However, it does not provide specific details on how to make a 13.5 nm light source.

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