Sputtering Al은 비정질이야 polycrystalline이야 ?
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Aluminum nitride (AlN) films can have both amorphous and polycrystalline phases . The study by Bakri et al. found that polycrystalline AlN films with a hexagonal wurtzite structure can be obtained through sputtering . Similarly, Zhou et al. synthesized polycrystalline γ-Al2O3 films using twin targets reactive high power impulse magnetron sputtering (TTR-HiPIMS) . Bolzan et al. also observed that In(y)Al(x)Sb(1-x-y) films deposited at 420 °C are polycrystalline with a zincblende phase . On the other hand, Ji et al. investigated the deposition of Al-Cu-Fe quasi-crystalline coatings and did not specifically mention the crystallinity of the films . Therefore, based on the available information, it can be concluded that AlN, γ-Al2O3, and In(y)Al(x)Sb(1-x-y) films mentioned in the abstracts are polycrystalline, while the crystallinity of Al-Cu-Fe coatings is not specified.
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| Papers (4) | Insight |
|---|---|
5 Citations | The paper states that the films deposited by magnetron sputtering are polycrystalline, but it does not specifically mention whether the films with Al are polycrystalline or amorphous. |
20 Citations | The paper states that the as-deposited films were polycrystalline γ-Al2O3, indicating that the sputtered alumina films are polycrystalline. |
| The paper states that aluminium nitride films grown by reactive ion plasma sputtering contain both amorphous and polycrystalline phases. Therefore, sputtering Al can result in both amorphous and polycrystalline films. | |
01 Jul 2019 1 Citations | The paper mentions that the AlN thin films deposited by RF sputtering are polycrystalline in nature. |
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