What are the most popular thin-film deposition methods?
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The most popular thin-film deposition methods include physical vapor deposition (PVD), chemical vapor deposition (CVD), and solution-based deposition techniques . PVD techniques, such as magnetron sputtering and ion plating, involve the production of vapors through resistive heating, atomic sputtering, or other methods, and are widely used for thin-film formation . CVD techniques, on the other hand, involve the use of vapors obtained from gas, liquid, or solid precursors and rely on chemical reactions for film formation . Solution-based deposition techniques, such as chemical solution deposition and sol-gel preparation, offer advantages such as easy stoichiometric control, low-cost large-area deposition, and good control over film properties . These methods have been extensively used for various applications, including photovoltaics, sensors, energy storage, catalysis, and biomedical devices .
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01 Jun 2021 1 Citations | The paper discusses various pulsed methods of thin film deposition such as magnetron sputtering HIPIMS, pulsed laser deposition PLD, vacuum arc pulsed deposition, and high-intensity pulsed ion beams deposition HIPIB. |
| The paper discusses physical methods for thin-film deposition, including physical vapor deposition (PVD) and chemical vapor deposition (CVD). | |
09 Dec 2022 | The paper does not explicitly mention the most popular thin-film deposition methods. |
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