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What are the problems with Magnesium oxide thin films? 


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Magnesium oxide (MgO) thin films face several problems. Firstly, MgO is highly hygroscopic, leading to deterioration of its optical properties when exposed to ambient conditions . Secondly, the growth behavior of MgO thin films is affected by the choice of oxygen source during atomic layer deposition (ALD), with adverse reactions observed when using H2O as the oxygen source . Thirdly, the high stability and slow reaction kinetics of MgH2 hydride hinder its use as a hydrogen storage material, but nano-structuring and stress/strain effects can enhance its hydrogen storage properties . Additionally, the structural properties of MgO thin films grown using chemical bath deposition (CBD) are influenced by annealing temperature, with amorphous structures observed at lower temperatures and nanorod-like structures at higher temperatures . Lastly, the exposure of MgO thin films to water during fabrication can cause material loss and changes in film properties, compromising device performance .

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The provided paper does not mention any problems with Magnesium oxide thin films. The paper is about the stability, electronic structure, and thermodynamic properties of nanostructured MgH2 thin films.
The provided paper does not mention any problems with Magnesium oxide thin films.
The problems with magnesium oxide thin films are their high hygroscopic nature, which leads to deterioration of their optical properties.
The paper does not explicitly mention any problems with Magnesium oxide thin films.

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