What causes blister formation in aluminium alloys ?
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Blister formation in aluminum alloys is caused by various factors. One of the main causes is the presence of casting defects, such as microstructural discontinuities, porosity, cold flakes, cold drops, cold shots, and thin oxide films . Another factor is the interaction between the aluminum oxide layer and the formation mechanisms, which can lead to the formation of hydrogen blisters . The formation of a skin layer during the solution treatment process can also contribute to blistering, as pore clusters or laminar defects can form in the skin layer and cause surface blistering . Additionally, the growth of blisters can be influenced by the presence of gases, such as nitrogen and carbon dioxide, which fill the blister nucleus and induce hydrogen precipitation in the surrounding aluminum . The occurrence of blisters can be predicted based on parameters such as pore volume, depth, aspect ratio, and ligament thickness .
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21 Citations | Blister formation in aluminum alloys is caused by high plastic strain accumulation in localized regions between the pore and the outer surface, as well as by critical ligament thickness and temperature. |
22 Citations | Blister formation in aluminium alloys is caused by the growth of a blister nucleus through creep deformation of the surrounding aluminium due to high internal gas pressure. |
6 Citations | Blister formation in aluminium alloys is caused by the formation of pore clusters or laminar defects in the skin layer during solution treatment, as discussed in the provided paper. |
| The paper discusses that blister formation in aluminum alloys during heat treatment is caused by the interaction of the aluminum oxide layer with the formation mechanisms, as well as permeability, diffusion, and hydrogen solubility in the microstructure. | |
| The blister formation in aluminum alloys is caused by casting defects, such as microstructural discontinuities, gases present in discontinuities, and cold flakes, porosity, cold drops, cold shots, and thin oxide films. |
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