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What is the optimal thickness of Bi2Se3 for a Bi2Se3 device? 


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The optimal thickness of Bi2Se3 for a Bi2Se3 device depends on the specific application and desired performance. Several studies have investigated the effect of thickness on the properties of Bi2Se3 films. Fan et al. demonstrated that a thin Bi2Se3 flake with a thickness of 8-15 nm exhibited n-type behavior and could be used as an absorption layer in a photodetector . Liang et al. found that a Bi2Se3 film with a thickness of 15 nm showed the best performance as a self-powered light position-sensitive detector, with a high position sensitivity and fast response time . Antonova et al. studied Bi2Se3 films grown on printed graphene and found that films with a thickness of 20-30 nm had desirable properties for electronic and optical applications . Nasir et al. explored the growth of ultra-thin Bi2Se3 films with a thickness down to 4 nm and found that substrate pre-treatment was critical for obtaining completely coalesced films . Therefore, the optimal thickness of Bi2Se3 for a device depends on the specific application and can range from a few nanometers to tens of nanometers.

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The optimal thickness of Bi2Se3 for a Bi2Se3 device is not mentioned in the paper.
The optimal thickness of Bi2Se3 for a Bi2Se3 device is not mentioned in the paper.
The optimal thickness of Bi2Se3 for a Bi2Se3 device is 15 nm, as it shows the best performance with a position sensitivity of up to 89.7 mV/mm.
The provided paper is about the thickness modulation of incline-grown Bi2O2Se, not Bi2Se3. The optimal thickness of Bi2Se3 for a Bi2Se3 device is not mentioned in the paper.

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