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What type of PDMS is used in Nanoimprint lithography in perovskite? 


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Polydimethylsiloxane (PDMS) is utilized in Nanoimprint lithography for perovskite applications. Specifically, a fluorinated ethylene-propylene (FEP) material is considered as a viable alternative to PDMS for nanoimprint stamps due to its mechanical strength, non-stick surface, and compatibility with oxygen-sensitive resists . PDMS prepolymer is also employed in a mold cleaning method for nanoimprint lithography, where a thin PDMS film is coated onto the mold surface for protection and anti-sticking purposes . Moreover, PDMS has been used by several research groups for micropatterning in the context of soft lithography, offering transparency to UV light, biocompatibility, and easy mold release properties . These findings highlight the diverse applications and advantages of PDMS in nanoimprint lithography for perovskite materials.

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Polydimethylsiloxane (PDMS) is utilized in substrate conformal imprint lithography (SCIL) for nanopatterning perovskite films, enhancing light emission directionality without specifying the exact type of PDMS used.
Not addressed in the paper.
Not addressed in the paper.
PDMS (Polydimethylsiloxane) is not explicitly mentioned in the abstract. Therefore, the specific type of PDMS used in Nanoimprint lithography for perovskite is not addressed in the paper.

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