Showing papers on "Chromium(III) oxide published in 1990"
TL;DR: In this paper, a spray pyrolysis method was used on n-type silicon wafers by using a chromium acetylacetonate complex, which gave different rates of film deposition.
16 citations
TL;DR: In this paper, the mechanism of sintering in chromium(III) oxide in the presence of varying amounts of lanthanum oxide under firing conditions which simulate a controlled reducing atmosphere was investigated.
Abstract: The mechanism of sintering in chromium(III) oxide in the presence of varying amounts of lanthanum oxide under firing conditions which simulate a controlled reducing atmosphere, has been investigated. The investigation is based on isothermal shrinkage measurements at different temperatures. The data suggest that the vapour-phase transport mechanism becomes predominant with evidence of a grain-boundary diffusion process.
3 citations