Showing papers on "Indium tin oxide published in 1972"

Selective etching of metal oxides of tin or indium

Abstract: Metal oxides such as tin oxide and indium oxide are selectively etched by coating the surface to be etched with photoresist, selectively exposing the photoresist in a desired pattern and developing the photoresist to remove the unexposed areas. In the case of tin oxide, for example, the unprotected tin oxide and remaining photoresist are then coated with a water-or-alcoholsoluble polymer including powdered zinc, for example. The polymer solution with the zinc dispersed therein is then dried in an oven to remove residual solvent, leaving a uniform, tenacious film of zinc dispersed in the polymer. The tin oxide is then etched in a hydrochloric acid solution. The hydrochloric acid reacts with the zinc to produce atomic hydrogen which reduces the tin oxide to tin, which in turn is etched with the hydrochloric acid, thereby producing an etched pattern in the tin oxide.