A
A. Caballero
Researcher at Spanish National Research Council
Publications - 8
Citations - 378
A. Caballero is an academic researcher from Spanish National Research Council. The author has contributed to research in topics: Absorption spectroscopy & Thin film. The author has an hindex of 8, co-authored 8 publications receiving 360 citations.
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Journal ArticleDOI
Structural, Optical, and Photoelectrochemical Properties of Mn+−TiO2 Model Thin Film Photocatalysts
TL;DR: In this article, it was shown that Mn+−TiO2 crystallizes into anatase or rutile structures depending on the type and amount of cations present in the film and the local environment around the different cations has been ascertained by X-ray absorption spectroscopy.
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XPS Study of Interface and Ligand Effects in Supported Cu2O and CuO Nanometric Particles
TL;DR: An analysis of the changes in the photoemission parameters of copper in small particles of copper oxides deposited on silicon dioxide is reported, of relevance for investigations in the fields of heterogeneous catalysis and coordination chemistry.
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Chemical stability of Sin+ species in SiOx (x<2) thin films
Angel Barranco,José A. Mejías,Juan P. Espinós,A. Caballero,Agustín R. González-Elipe,Francisco Yubero +5 more
TL;DR: In this article, the structure of these thin films has been described as formed by tetrahedra of the type Si−(Si, O3) and Si-(Si3, O), in agreement with the Si 2p photoelectron spectra.
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Structure and chemistry of SiOx (x<2) systems
Angel Barranco,Francisco Yubero,Juan P. Espinós,Juan P. Holgado,A. Caballero,Agustín R. González-Elipe,José A. Mejías +6 more
TL;DR: In this paper, the structure of SiO x materials and the chemical stability of Si n+ (n < 4) species have been investigated experimentally by photoemission and X-ray absorption spectroscopy.
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Contribution of the x‐ray absorption spectroscopy to study TiO2 thin films prepared by ion beam induced chemical vapor deposition
A. Caballero,Dietmar Leinen,Asunción Fernández,Ángel Justo,Juan P. Espinós,Agustín R. González-Elipe +5 more
TL;DR: In this paper, an ion beam induced chemical vapor deposition procedure (IBICVD) consisting of the bombardment of a substrate with accelerated O+2 ions while the vapor of a volatile metallic precursor is directed on its surface is presented.