scispace - formally typeset
A

A. Foucaran

Researcher at Centre national de la recherche scientifique

Publications -  9
Citations -  249

A. Foucaran is an academic researcher from Centre national de la recherche scientifique. The author has contributed to research in topics: Thin film & Chemical vapor deposition. The author has an hindex of 8, co-authored 9 publications receiving 246 citations.

Papers
More filters
Journal ArticleDOI

Preparation and characterization of MOCVD bismuth telluride thin films

TL;DR: The thermoelectric, electric and structural properties of Bi 2 Te 3 thin films grown by MOCVD have been investigated as mentioned in this paper The Seebeck coefficient shows that all the samples were n-type conductors decreasing from 213 to 129μV/K when the carrier concentration increases from 9×10 19 to 3×10 20 cm −3.
Journal ArticleDOI

MOCVD growth of Bi2Te3 layers using diethyltellurium as a precursor

TL;DR: In this paper, the growth of Bi 2 Te 3 thin films by metal organic chemical vapour deposition (MOCVD) using diethytellurium and trimethylbismuth as tellurium or bismuth sources respectively is investigated on pyrex substrates.
Journal ArticleDOI

Electrical and Thermoelectrical Properties of Sb2Te3 Prepared by the Metal-Organic Chemical Vapor Deposition Technique

TL;DR: In this article, a detailed analysis of the behavior of Sb2Te3 thin compounds on pyrex substrates was carried out in an attempt to evaluate the effect of the VI=V ratio on electrical and thermoelectrical properties.
Journal ArticleDOI

Growth of Ga1−xAlxSb and Ga1−xInxSb by organometallic chemical vapor deposition

TL;DR: In this paper, the growth conditions of Ga 1− x Al x Sb (x ⩽05) and Ga Sb with trimethylgallium, trimethylantimony and trimethylaluminium were detailed on GaSb and GaAs substrates.
Journal ArticleDOI

Effect of antimony concentration on the electrical and thermoelectrical properties of (Bi1-xSbx)2Te3 thin films grown by metal organic chemical vapour deposition (MOCVD) technique

TL;DR: In this article, the electrical and thermoelectrical performances of p-type (Bi1−xSbx)2Te3 elaborated by metal organic chemical vapour deposition (MOCVD) in horizontal quartz reactor on pyrex substrate are discussed.