Basic operational characteristics of the plasma focus are considered from design perspectives to develop powerful radiation sources. Using these ideas we have developed two compact plasma focus (CPF) devices operating in neon with high performance and high repetition rate capacity for use as an intense soft X-ray (SXR) source for microelectronics lithography. The NX1 is a four-module system with a peak current of 320 kA when the capacitor bank (7.8 /spl mu/F/spl times/4) is charged to 14 kV. It produces 100 J of SXR per shot (4% wall plug efficiency) giving at 3 Hz, 300 W of average SXR power into 4/spl pi/. The NX2 is also a four-module system. Each module uses a rail gap switching 12 capacitors each with a capacity of 0.6 /spl mu/F. The NX2 operates with peak currents of 400 kA at 11.5 kV into water-cooled electrodes at repetition rates up to 16 Hz to produce 300 W SXR in burst durations of several minutes. SXR lithographs are taken from both machines to demonstrate that sufficient SXR flux is generated for an exposure with only 300 shots. In addition, flash electron lithographs are also obtained requiring only ten shots per exposure. Such high performance compact machines may be improved to yield over 1 kW of SXR, enabling sufficient exposure throughput to be of interest to the wafer industry. In deuterium the neutron yield could be over 10/sup 10/ neutrons per second over prolonged bursts of minutes.

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High rep rate high performance plasma focus as a powerful radiation source

Thin films of poly(3-methylthiophene) (P3MT), poly(3-butylthiophene) (P3BT) and poly(3-hexylthiophene) (P3HT) have been patterned into microstructures using the 325 nm radiation from a helium-cadmium laser. At sufficiently high energy fluences, spontaneous mass removal occurred in all three polymers to give groove structures about 3 μm wide. At lower incident fluences, both P3BT and P3HT underwent crosslinking as a result of the irradiation. Using chloroform as a developer, 1–6 μm wide line structures were obtained on glass substrates. For the lowest fluences, the P3BT linewidths after development were narrower than the nominal beam diameter. The present results are potentially useful to the fabrication of polymer electronic devices and microlithography.

Patterning of poly(3-alkylthiophene) thin films by direct-write ultraviolet laser lithography

Low Temperature Lithium-ion Batteries Electrolytes: Rational Design, Advancements, and Future Perspectives

This work summarizes the design and construction of the first Iranian 115 kJ Mather type plasma focus (PF) machine (IR-MPF-100). This machine consists of a 6.25 cm radius and 22 cm height brass made anode with a 50 mm height insulator which separates the anode and cathode electrodes. Twelve copper made 22 cm height rods play the role of cathode with 10.2 cm radius. Twenty four 6 μF capacitors were used with the maximum charging voltage of 40 kV (maximum energy of 115 kJ) as the capacitor bank and maximum theoretical current around 1.224 MA. The total inductance of the system is 120 nH. By using NE-102 plastic Scintillator, Rogowski coil, current and voltage probes, hard X-ray, current derivative, current and voltage signals of IR-MPF-100 were measured. The primary result of neutron detection by neutron activation counter represents approximately 109 neutrons per shot at 65 kJ discharge energy while using deuterium filling gas. Also IR-MPF-100 PF has been tested successfully at 90 kJ by using the argon gas.

Preliminary Results of the 115 kJ Dense Plasma Focus Device IR-MPF-100

Zn3V3O8@ZnO@NC heterostructure for stable zinc ion storage from assembling nanodisks into cross-stacked architecture

With the excessive consumption of nonrenewable resources, the exploration of effective and durable materials is highly sought after in the field of sustainable energy conversion and storage system. In this aspect, metal‐organic frameworks (MOFs) are a new class of crystalline porous organic‐inorganic hybrid materials. MOFs have recently been gaining traction in energy‐related fields. Owing to the coordination flexibility and multiple accessible oxidation states of vanadium ions or clusters, vanadium‐MOFs (V‐MOFs) possess unique structural characteristics and satisfactory electrochemical properties. Furthermore, V‐MOFs‐derived materials also exhibit superior electrical conductivity and stability when used as electrocatalysts and electrode materials. This review summarizes the research progress of V‐MOFs (inclusive of pristine V‐MOFs, V/M‐MOFs, and POV‐based MOFs) and their derivatives (vanadium oxides, carbon‐coated vanadium oxide, vanadium phosphate, vanadate, and other vanadium doped nanomaterials) in electrochemical energy conversion (water splitting, oxygen reduction reaction) and energy storage (supercapacitor, rechargeable battery). Future possibilities and challenges for V‐MOFs and their derivatives in terms of design and synthesis are discussed. Lastly, their applications in energy‐related fields are also highlighted.

https://onlinelibrary.wiley.com/doi/pdfdirect/10.1002/smm2.1091

Vanadium‐based metal‐organic frameworks and their derivatives for electrochemical energy conversion and storage

The high cost and scarcity of lithium resources have prompted researchers to seek alternatives to lithium-ion batteries. Among emerging "Beyond Lithium" batteries, rechargeable aluminum-ion batteries (AIBs) are yet another attractive electrochemical storage device due to their high specific capacity and the abundance of aluminum. Although the current electrochemical performance of nonaqueous AIBs is better than aqueous AIBs (AAIBs), AAIBs have recently gained attention due to their low cost and enhanced safety. Extensive efforts are devoted to developing AAIBs in the last few years. Yet, it is still challenging to achieve stable electrodes with good electrochemical performance and electrolytes without side reactions. This review summarizes the recent progress in the exploration of anode and cathode materials and the selection of electrolytes of AAIBs. Lastly, the main challenges and future research outlook of high-performance AAIBs are also presented.

Rechargeable Aqueous Aluminum-Ion Battery: Progress and Outlook.

A 1.8kJ compact plasma focus source operated in neon is demonstrated as an x-ray source for microlithography in the wavelength range of 0.8-1.4 nm. Lithographs are obtained by exposing the resist to the x-ray point source with a mask in contact with the resist. The total energy emitted is measured using PIN diodes and photoconducting diamond detectors to be 15J per shot with a spectrum peaked at 1keV corresponding to the K shell lines from the neon working gas. The maximum repetition rate of 20 Hz allows lithographs to be obtained in less than 20 seconds when a reasonably sensitive resist is used.

Preliminary results on x-ray lithography using a compact plasma focus

We have developed two compact plasma focus devices operating in neon with high repetition rate capacity to be used as a repetitive pulse soft x-ray (SXR) source for lithography. A single capacitor module 1-1-1 was used to test high repetitive rate capability and was observed to produce soft x-rays in the wavelength range of 0.8-1.4 nm at up to 10 Hz. The discharge current rises in 1.2 us to peak value of 140 kA at 15 kV charge. The soft x-ray yield varies with the pressure of working gas, the value and polarity of voltage applied to capacitor.On the basis of this module we have designed a our module test system for SXR designated as the NX1. The peak discharge current is 270 kA when the capacitor bank is charged to 12kV. It produces 100J of soft x-ray per shot in single shot mode, in the wavelength range of 0.8 to 1.4nm and a spot size of below 1mm viewed end on. With a repetitive rate of up to 3Hz this gives 300W of average SXR power. The NX2 is a second system that has been designed and constructed. It will be operated at peak currents in excess of 300kA into water-cooled electrodes at repetitive rates up to 20Hz to produce 300W SXR in burst durations of up to 5 minutes. It is estimated that with such a SXR yield into a well designed beamline and a reasonably sensitive resist an exposure could be made in less than 10 seconds. Pushing such x-ray sources further to 2 kW output will make their intensity sufficient for SXR lithography with reasonably high throughput to be of industrial interest.

A. Thang

Papers

Vanadium‐based metal‐organic frameworks and their derivatives for electrochemical energy conversion and storage

Rechargeable Aqueous Aluminum-Ion Battery: Progress and Outlook.

Preliminary results on x-ray lithography using a compact plasma focus

Compact plasma focus soft x-ray source with high repetition rate and high intensity

Inside Front Cover: Volume 3 Issue 3