scispace - formally typeset
A

Adrian Stefan Avramescu

Researcher at Osram Opto Semiconductors GmbH

Publications -  71
Citations -  1341

Adrian Stefan Avramescu is an academic researcher from Osram Opto Semiconductors GmbH. The author has contributed to research in topics: Laser & Layer (electronics). The author has an hindex of 17, co-authored 69 publications receiving 1229 citations.

Papers
More filters
Journal ArticleDOI

Measurement of specimen thickness and composition in Al(x)Ga(1-x)N/GaN using high-angle annular dark field images.

TL;DR: Estimation of the specimen thickness combined with evaluation of intensity ratios allows quantitative measurement of the composition x and in high-resolution images it is found that the image intensity is well described by simulation if the simulated image is convoluted with a Gaussian with a half-width at half-maximum of 0.07 nm.
Journal ArticleDOI

Composition mapping in InGaN by scanning transmission electron microscopy.

TL;DR: Evidence is given for the existence of In rich regions in an InGaN layer which shows signatures of quantum dot emission in microphotoluminescence spectroscopy experiments.
Patent

Optoelectronic component and method for producing an optoelectronic component

TL;DR: In this paper, the authors define an optoelectronic component as a semiconductor component having an active region that emits or receives light during operation and a sealing material applied by atomic layer deposition on at least one surface region, the sealing material covering the surface region in a hermetically impermeable manner.
Journal ArticleDOI

True Green Laser Diodes at 524 nm with 50 mW Continuous Wave Output Power on c-Plane GaN

TL;DR: In this paper, an epitaxial design and material quality on a c-plane GaN substrate was proposed for green laser diodes with an emission wavelength of 531.7 nm and wall plug efficiency up to 2.3% at 50 mW optical output power.
Journal ArticleDOI

Quality and thermal stability of thin InGaN films

TL;DR: In this paper, the influence of the indium content, the annealing temperature and the barrier structure on the quantum-well stability was investigated, and it was found that quantum wells with indium contents higher than 20% degrade due to the diffusion of indium atoms.