A
Akira Fujishima
Researcher at University of Tokyo
Publications - 581
Citations - 26134
Akira Fujishima is an academic researcher from University of Tokyo. The author has contributed to research in topics: Photocatalysis & Electrode. The author has an hindex of 82, co-authored 581 publications receiving 24846 citations. Previous affiliations of Akira Fujishima include Dresden University of Technology.
Papers
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Journal ArticleDOI
Electroless Deposition of Metal Micropatterns Using Ink-jetted ZnO Thin Films as Templates
Hiroki Kono,Munetoshi Sakai,Xintong Zhang,Hajime Yoshiki,Kazuya Nakata,Taketoshi Murakami,Hideki Sakai,Masahiko Abe,Akira Fujishima +8 more
TL;DR: In this paper, metal (Cu and Ni) micropatterns were electrolessly fabricated on glass substrates using ink-jetted ZnO thin films as templates and without employing photo-irradiation.
Book ChapterDOI
Investigation of the structural ordering in thin naphthalocyanine films using scanning probe microscopy
TL;DR: This article used scanning probe microscopy to investigate the molecular orientation of various naphthalocyanine (Nc) thin films as a function of substrate temperature and found that metal-Nc molecules grew in a more ordered fashion with even epitaxial behavior under certain conditions.
Book ChapterDOI
Procedure 14 Deposition of boron-doped diamond films and their anodic treatment for the oxygen-terminated diamond sensor
Chiaki Terashima,Akira Fujishima +1 more
TL;DR: In this paper, a procedure to deposit a conductive diamond thin film on silicon substrate and check the electrochemical properties of the oxygen-terminated diamond electrodes was presented, and the electrode kinetics were strongly influenced by the surface termination in K4Fe(CN)6 and ascorbic acid.
Journal ArticleDOI
In Situ Observations of Electrode/Solution Interfaces Using a Scanning Tunneling Microscope
TL;DR: In this article, a review of in situ observations of the under potential deposition (UPD) of metals, various structural changes and reconstructions induced electrochemically, adsorbates on electrode surfaces, and photoelectrochemical processes on semiconductor electrodes is presented.