A
Alfred Ludwig
Researcher at Ruhr University Bochum
Publications - 321
Citations - 8926
Alfred Ludwig is an academic researcher from Ruhr University Bochum. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 38, co-authored 301 publications receiving 6699 citations. Previous affiliations of Alfred Ludwig include Center of Advanced European Studies and Research.
Papers
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Journal ArticleDOI
Novel strain sensors based on magnetostrictive GMR/TMR structures
M. Löhndorf,T. Duenas,Alfred Ludwig,Manfred Rührig,Joachim Dr. Wecker,Daniel E. Bürgler,P. Grunberg,Eckhard Quandt +7 more
TL;DR: In this article, the authors present an investigation into various magnetic layer structures suitable for devices sensing mechanical responses such as stress, strain and pressure, and present an approach to exploit these materials in broader industrial applications.
Journal ArticleDOI
Functional and structural fatigue of titanium tantalum high temperature shape memory alloys (HT SMAs)
Thomas Niendorf,Philipp Krooß,E. Batyrsina,Alexander Paulsen,Yahya Motemani,Alfred Ludwig,Pio John S. Buenconsejo,Jan Frenzel,Gunther Eggeler,Hans Jürgen Maier +9 more
TL;DR: In this article, a ternary shape memory alloys (HT SMAs) for actuators with high work output and good mechanical properties are used in numerous applications, such as actuators made from shape memory alloy (SMAs) made from nickel-titanium (Ni-Ti).
Journal ArticleDOI
The effect of cast microstructure and crystallography on rafting, dislocation plasticity and creep anisotropy of single crystal Ni-base superalloys
TL;DR: In this paper, the authors investigate three mechanical and microstructural aspects of high temperature and low stress creep of the single crystal superalloy LEK 94 and show that dislocation densities in dendritic regions are always higher than in interdendritic areas.
Journal ArticleDOI
CrN/AlN nanolaminate coatings deposited via high power pulsed and middle frequency pulsed magnetron sputtering
TL;DR: In this article, high power pulsed magnetron sputtering (HPPMS) is used to control the energetic bombardment of the substrate due to the higher ionization degree of metallic species.
Patent
Sensor device having a magnetostrictive force sensor
TL;DR: In this article, a sensor device having a magnetostrictive force sensor is provided, where the sensor device contains a TMR force sensor element having a magnetic detection layer of material having the magnetostriction coefficient λ≧|5·10−6|, a magnetically harder reference layer, and a tunnel barrier disposed between these layers.