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Aliekber Aktag

Researcher at Abant Izzet Baysal University

Publications -  23
Citations -  334

Aliekber Aktag is an academic researcher from Abant Izzet Baysal University. The author has contributed to research in topics: Thin film & Equivalent series resistance. The author has an hindex of 10, co-authored 21 publications receiving 278 citations.

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Frequency dependent electrical characteristics of BiFeO3 MOS capacitors

TL;DR: In this article, the frequency dependent electrical behavior of BiFeO 3 MOS capacitors was investigated by XRD and SEM measurements for several frequencies from 10-kHz to 1-MHz.
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Samarium oxide thin films deposited by reactive sputtering: Effects of sputtering power and substrate temperature on microstructure, morphology and electrical properties

TL;DR: In this article, the effects of increase in sputtering power and substrate temperature on the microstructural, morphological and electrical properties of Sm 2 O 3 thin films have been reported.
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Effects of post deposition annealing, interface states and series resistance on electrical characteristics of HfO 2 MOS capacitors

Abstract: The purposes of this paper are to investigate the post deposition annealing (PDA) effect on structural and electrical characterizations of HfO2 MOS capacitor and the frequency dependency of series resistance and interface states in this device. PDA processes on the HfO2 films deposited using RF magnetron sputtering system were performed in N2 ambient at 350, 550, 650, and 750 °C. The phase identifications and crystallization degrees of the HfO2 films were determined by using X-ray diffractometry. The grain size of the films was varied from 4.5 to 15.23 with increasing in PDA temperature. The HfO2 MOS capacitors were fabricated using the as-deposited and annealed films for electrical characterization. C–V and G/ω–V measurements were performed at 1 MHz frequency. The C–V characteristics of the MOS capacitor fabricated with film annealed at 550 °C show a better behaviour in terms of the high dielectric constant and low effective oxide charge compared to others. For this device, C–V and G/ω–V measurements were performed in different frequencies ranging from 10 kHz to 1 MHz at room temperature. Obtained results show that series resistance and interface states strongly influence the C–V and G/ω–V behaviour of the MOS capacitor.
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Formation of an anisotropy lattice in Co/Pt multilayers by direct laser interference patterning

TL;DR: In this article, direct laser interference patterning was used to form an anisotropic lattice in Co∕Pt thin film multilayers, and the lattice was characterized by strong perpendicular magnetic anisotropy in which the magnetic moment is perpendicular to the film plane.
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Evaluation of Radiation Sensor Aspects of $\text{Er}_2$ $\text{O}_3$ MOS Capacitors under Zero Gate Bias

TL;DR: In this paper, the use of Erbium Oxide (Er}_2$ $\text {O}_3$ ) as a gate dielectric in MOS-based radiation sensors was investigated.