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Ana Borras

Researcher at Spanish National Research Council

Publications -  103
Citations -  2762

Ana Borras is an academic researcher from Spanish National Research Council. The author has contributed to research in topics: Thin film & Wetting. The author has an hindex of 29, co-authored 91 publications receiving 2279 citations. Previous affiliations of Ana Borras include University of Seville & Swiss Federal Laboratories for Materials Science and Technology.

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Perspectives on oblique angle deposition of thin films: From fundamentals to devices

TL;DR: In this article, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques.
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Enhancing Moisture and Water Resistance in Perovskite Solar Cells by Encapsulation with Ultrathin Plasma Polymers

TL;DR: A method to improve the stability of perovskite solar cells under water and moisture exposure consisting of the encapsulation of the cell with an ultrathin plasma polymer is reported, which opens up a new promising strategy to develop stable photovoltaic and photocatalytic perovkite devices.
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Impact of moisture on efficiency-determining electronic processes in perovskite solar cells

TL;DR: In this article, the degradation rate of perovskite solar cells was investigated by structural (SEM, EDS, XRD and XPS) and device characterization (impedance and intensity modulated photocurrent spectroscopy) techniques.
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Reversible superhydrophobic to superhydrophilic conversion of Ag@TiO2 composite nanofiber surfaces.

TL;DR: A new type of superhydrophobic material consisting of a surface with supported Ag@TiO(2) core-shell nanofibers has been prepared at low temperature by plasma-enhanced chemical vapor deposition (PECVD), one of the few examples existing in the literature where a superHydrophobic surface transforms reversibly into a superhydrophic one as an effect of light irradiation.
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Effect of Visible and UV Illumination on the Water Contact Angle of TiO2 Thin Films with Incorporated Nitrogen

TL;DR: In this article, the incorporation of nitrogen within the structure of TiO2 thin films has been accomplished by N2+ ion implantation in anatase thin films (50 keV ion energy for doses of 3 × 1016, 6 × 1000, and 1.2 × 1017 ions cm-2) and during preparation by metalorganic chemical vapor deposition (MOCVD) using nitrogen as carrier gas.