Alberto Palmero

TL;DR: In this article, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques.

TL;DR: A Ti6Al4V alloy of medical grade has been coated with Ti nanostructures employing the glancing angle deposition technique by magnetron sputtering, which exhibits strongly impaired bacterial adhesion that inhibits biofilm formation, while osteoblasts exhibit good cell response with similar behavior to the initial substrates.

TL;DR: Results indicate that the morphological features of the films strongly depend on the experimental conditions, but can be categorized within four generic microstructures, each of them defined by a different bulk geometrical pattern, pore percolation depth and connectivity.

TL;DR: In this paper, the growth of Ti thin films by the magnetron sputtering technique at oblique angles and at room temperature is analyzed from both experimental and theoretical points of view, and it is shown that surface mobilization processes associated to a highly directed momentum distribution and the relatively high kinetic energy of sputtered atoms are responsible for this behavior.

TL;DR: In this paper, the tilt angle of nanostructures obtained by glancing angle sputtering is finely tuned by selecting the adequate argon pressure at low pressures, yielding high directional atoms that form tilted nanocolumns High pressures lead to a diffusive regime which gives rise to vertical columnar growth.