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Antoine Gaston Marie Kiers
Researcher at ASML Holding
Publications - 24
Citations - 1063
Antoine Gaston Marie Kiers is an academic researcher from ASML Holding. The author has contributed to research in topics: Substrate (printing) & Numerical aperture. The author has an hindex of 11, co-authored 24 publications receiving 1063 citations.
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Patent
Method and apparatus for angular-resolved spectroscopic lithography characterization
Arie Jeffrey Den Boef,Arno Jan Bleeker,Youri van Dommelen,Mircea Dusa,Antoine Gaston Marie Kiers,Paul Frank Luehrmann,Henricus Petrus Maria Pellemans,Maurits van der Schaar,Grouwstra Cedric Desire,Markus Gerardus Martinus Maria Van Kraaij +9 more
TL;DR: In this article, a method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate was proposed.
Patent
Method and apparatus for angular-resolved spectroscopic lithography characterisation
TL;DR: In this paper, an apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate was presented.
Patent
Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method
TL;DR: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used as discussed by the authors, the first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated.
Patent
Method to determine the value of process parameters based on scatterometry data
TL;DR: In this paper, a method for obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate, is described, where each marker structure set includes at least one calibration marker structure created using different known values of the process parameter.
Patent
Test pattern, inspection method, and device manufacturing method
Arie Jeffrey Den Boef,Hans Van Der Laan,Antonius Johannes Josephus van Dijsseldonk,Mircea Dusa,Antoine Gaston Marie Kiers +4 more
TL;DR: In this paper, a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus was used to derive information concerning the aberration, and the test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to infer information indicative of comatic aberration.