Youri van Dommelen

TL;DR: In this article, a method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate was proposed.

TL;DR: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is described in this paper.

TL;DR: The litho and patterning challenges at the 22nm node are looked into for memory and logic applications driven by the difference in device layout and common challenges are found for periphery of memory and random logic SRAM cells.

TL;DR: In this article, a method and apparatus for obtaining focus information relating to a lithographic process is described, which includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form is not have the same focus dependence as that of the first structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target.

TL;DR: In this paper, the authors present an overview of mask contributors to imaging performance at the 27 nm node and below, such as CD uniformity, multilayer and absorber stack composition, thickness and reflectivity.