M
Mircea Dusa
Researcher at ASML Holding
Publications - 135
Citations - 2368
Mircea Dusa is an academic researcher from ASML Holding. The author has contributed to research in topics: Lithography & Extreme ultraviolet lithography. The author has an hindex of 21, co-authored 133 publications receiving 2327 citations. Previous affiliations of Mircea Dusa include National Semiconductor.
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Method and apparatus for angular-resolved spectroscopic lithography characterization
Arie Jeffrey Den Boef,Arno Jan Bleeker,Youri van Dommelen,Mircea Dusa,Antoine Gaston Marie Kiers,Paul Frank Luehrmann,Henricus Petrus Maria Pellemans,Maurits van der Schaar,Grouwstra Cedric Desire,Markus Gerardus Martinus Maria Van Kraaij +9 more
TL;DR: In this article, a method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate was proposed.
Proceedings ArticleDOI
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Mircea Dusa,John Quaedackers,Olaf F. A. Larsen,Jeroen Meessen,Eddy van der Heijden,Gerald Dicker,Onno Wismans,Paul de Haas,Koen van Ingen Schenau,Jo Finders,Bert Vleeming,Geert Storms,Patrick Jaenen,Shaunee Cheng,Mireille Maenhoudt +14 more
TL;DR: A new CDU model was introduced to calculate double patterning budgets based on defining CD from its edges and pooling CD variance from two adjacent patterns within 2*Pitch distance, which achieved an experimental resolution of 32-nm 1/2 pitch on 1.2NA lithography system.
Proceedings ArticleDOI
Understanding the forbidden pitch and assist feature placement
TL;DR: In this article, it has been shown that the variation of the critical dimension as well as the exposure latitude of the main feature is a direct consequence of light field interference between the main features and the neighboring features.
Proceedings ArticleDOI
Novel diffraction-based spectroscopic method for overlay metrology
Weidong Yang,Roger R. Lowe-Webb,Silvio J. Rabello,Jiangtao Hu,Je-Yi Lin,John D. Heaton,Mircea Dusa,Arie Jeffrey Den Boef,Maurits van der Schaar,Adolph Hunter +9 more
TL;DR: In this article, a spectroscopic, diffraction based technique is proposed as an alternative solution for overlay metrology in technology nodes below 90 nanometers, which extracts alignment error from broadband diffraction efficiency of specially designed diffraction targets.
Proceedings ArticleDOI
Application challenges with double patterning technology (DPT) beyond 45 nm
Jungchul Park,Stephen Hsu,Douglas Van Den Broeke,J. Fung Chen,Mircea Dusa,Robert John Socha,Jo Finders,Bert Vleeming,Anton van Oosten,Peter Nikolsky,Vincent Wiaux,Eric Hendrickx,Joost Bekaert,Geert Vandenberghe +13 more
TL;DR: This paper addresses DPT application challenges with respect to both mask error factor (MEF) and 2D patterning and achieves overall k1 factor that exceeds the conventional Rayleigh resolution limit.