The Microsystems Technology Office of the U.S. Defense Advanced Research Projects Agency (DARPA) is developing revolutionary materials, devices, and integration techniques to meet the performance requirements for advanced microwave and millimeter-wave (mmW) systems. The DARPA Compound Semiconductor Materials on Silicon (COSMOS) program focused on developing new methods to tightly integrate compound semiconductor (CS) technologies within state-of-the-art silicon (Si) complementary?metal-oxide-semiconductor (CMOS) circuits to achieve unprecedented circuit performance levels. The DARPA Diverse Accessible Heterogeneous Integration (DAHI) program is continuing that work by developing heterogeneous integration processes to intimately combine advanced CS devices, as well as other emerging materials and devices, with high-density Si CMOS technology. DARPA has also pushed limits in Si technology and driven seminal developments in gallium nitride (GaN) device technology. Taken together, these programs are addressing many critical challenges for next-generation microwave and mmW systems and seek to revolutionize U.S. Department of Defense (DoD) capabilities in these areas.

A Revolution on the Horizon from DARPA: Heterogeneous Integration for Revolutionary Microwave\/Millimeter-Wave Circuits at DARPA: Progress and Future Directions

This invited paper reviews the progress of silicon–germanium (SiGe) bipolar-complementary metal–oxide–semiconductor (BiCMOS) technology-based integrated circuits (ICs) during the last two decades. Focus is set on various transceiver (TRX) realizations in the millimeter-wave range from 60 GHz and at terahertz (THz) frequencies above 300 GHz. This article discusses the development of SiGe technologies and ICs with the latter focusing on the commercially most important applications of radar and beyond 5G wireless communications. A variety of examples ranging from 77-GHz automotive radar to THz sensing as well as the beginnings of 60-GHz wireless communication up to THz chipsets for 100-Gb/s data transmission are recapitulated. This article closes with an outlook on emerging fields of research for future advancement of SiGe TRX performance.

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Millimeter-Wave and Terahertz Transceivers in SiGe BiCMOS Technologies

This paper reviews the state of emerging transistor technologies capable of terahertz amplification, as well as the state of transistor modeling as required in terahertz electronic circuit research. Commercial terahertz radar sensors of today are being built using bulky and expensive technologies such as Schottky diode detectors and lasers, as well as using some emerging detection methods. Meanwhile, a considerable amount of research effort has recently been invested in process development and modeling of transistor technologies capable of amplifying in the terahertz band. Indium phosphide (InP) transistors have been able to reach maximum oscillation frequency (fmax) values of over 1 THz for around a decade already, while silicon-germanium bipolar complementary metal-oxide semiconductor (BiCMOS) compatible heterojunction bipolar transistors have only recently crossed the fmax = 0.7 THz mark. While it seems that the InP technology could be the ultimate terahertz technology, according to the fmax and related metrics, the BiCMOS technology has the added advantage of lower cost and supporting a wider set of integrated component types. BiCMOS can thus be seen as an enabling factor for re-engineering of complete terahertz radar systems, for the first time fabricated as miniaturized monolithic integrated circuits. Rapid commercial deployment of monolithic terahertz radar chips, furthermore, depends on the accuracy of transistor modeling at these frequencies. Considerations such as fabrication and modeling of passives and antennas, as well as packaging of complete systems, are closely related to the two main contributions of this paper and are also reviewed here. Finally, this paper probes active terahertz circuits that have already been reported and that have the potential to be deployed in a re-engineered terahertz radar sensor system and attempts to predict future directions in re-engineering of monolithic radar sensors.

https://www.mdpi.com/1424-8220/19/11/2454/pdf

Emerging Transistor Technologies Capable of Terahertz Amplification: A Way to Re-Engineer Terahertz Radar Sensors.

This paper discusses advances related to the integration of future mobile electronic THz systems. Without claiming to provide a comprehensive review of this surging research area, the authors gathered research on selected topics that are expected to be of relevance for the future exploration of components for practical mobile THz imaging and sensing applications. First, a brief technology review of integrated mobile THz components is given. Advances in III-V technology, silicon technology, and resonant-tunneling diodes (RTD) are discussed. Based on an RTD source and a SiGe-HBT direct detector, low-cost and compact computed tomography is presented for volumetric continuous-wave imaging at around 300 GHz. Moreover, aspects of system integration of mobile THz MIMO radars are discussed. Thereby, a novel phase-locked loop concept utilizing a high-stability yttrium-iron-garnet-tuned oscillator to synthesize ultra-stable reference mmWave signals is shown, and an adaptive self-interference cancellation algorithm for THz MIMO in the digital domain based on Kalman filter theory is proposed.

Toward Mobile Integrated Electronic Systems at THz Frequencies

In this paper, an electromagnetic (EM) simulation assisted parameter extraction procedure is demonstrated for accurate modeling of down-scaled transferred-substrate InP HBTs. The external parasitic network associated with via transitions and device electrodes is carefully extracted from calibrated three-dimensional EM simulations up to 325 GHz. Following an on-wafer multi-line Through-Reflect-Line calibration procedure, the external parasitic network is de-embedded from the transistor measurements and the active device parameters are extracted in a reliable way. The small-signal model structure augmented with the distributed parasitic network provides accurate small-signal prediction up to 220 GHz.

/pdf/em-simulation-assisted-parameter-extraction-for-transferred-4v0r2hnsxr.pdf

EM simulation assisted parameter extraction for transferred-substrate InP HBT modeling

We present a wafer-level heterointegrated indium phosphide double heterobipolar transistor on silicon germanium bipolar-complementary metal oxide semiconductor (InP DHBT on SiGe BiCMOS) process which relies on adhesive wafer bonding. Subcircuits are co-designed in both technologies, SiGe BiCMOS and InP DHBT, with more than 300 GHz bandwidth microstrip interconnects. The 250 nm SiGe HBTs offer cutoff frequencies around 200 GHz, the 800 nm InP DHBTs exceed 350 GHz. Heterointegrated signal sources are demonstrated including a 328 GHz quadrupling source with dBm RF output power. A common design kit for full InP DHBT/SiGe BiCMOS co-design was set up. The technology is being opened to third-party customers through IHP's multi-purpose wafer foundry interface.







Microphotograph of InP DHBT / SiGe BiCMOS wafer

Anton Datsuk

Papers

SciFab -a wafer-level heterointegrated InP DHBT/SiGe BiCMOS foundry process for mm-wave applications