M
Marco Lisker
Researcher at Innovations for High Performance Microelectronics
Publications - 99
Citations - 1016
Marco Lisker is an academic researcher from Innovations for High Performance Microelectronics. The author has contributed to research in topics: Thin film & Chemical vapor deposition. The author has an hindex of 15, co-authored 88 publications receiving 885 citations. Previous affiliations of Marco Lisker include Otto-von-Guericke University Magdeburg.
Papers
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Proceedings ArticleDOI
SiGe HBT with fx/fmax of 505 GHz/720 GHz
Bernd Heinemann,Holger Rucker,R. Barth,F. Barwolf,J. Drews,Gunter Fischer,A. Fox,O. Fursenko,Thomas Grabolla,Frank Herzel,Jens Katzer,J. Korn,A. Kruger,P. Kulse,T. Lenke,Marco Lisker,Steffen Marschmeyer,A. Scheit,D. Schmidt,J. Schmidt,M. A. Schubert,Andreas Trusch,C. Wipf,D. Wolansky +23 more
TL;DR: An experimental SiGe HBT technology featuring fT/fmax/BVCEO = 505 GHz/720 GHz/1.6 V and a minimum CML ring oscillator gate delay of 1.34 ps is presented in this article.
Journal ArticleDOI
Hybrid Graphene/Silicon Schottky photodiode with intrinsic gating effect
Antonio Di Bartolomeo,Giuseppe Luongo,Filippo Giubileo,Nicola Funicello,Gang Niu,Thomas Schroeder,Marco Lisker,Grzegorz Lupina +7 more
TL;DR: In this paper, a hybrid device consisting of a graphene/silicon (Gr/Si) Schottky diode in parallel with a Gr/SiO2/Si capacitor was proposed for high-performance photodetection.
Journal ArticleDOI
Hybrid graphene/silicon Schottky photodiode with intrinsic gating effect
Antonio Di Bartolomeo,Giuseppe Luongo,Filippo Giubileo,Nicola Funicello,Gang Niu,Thomas Schroeder,Marco Lisker,Grzegorz Lupina +7 more
TL;DR: In this article, a hybrid device consisting of a graphene/silicon (Gr/Si) Schottky diode in parallel with a Gr/SiO2/Si capacitor was proposed for high-performance photodetection.
Journal ArticleDOI
Dispersion engineered silicon nitride waveguides by geometrical and refractive-index optimization
J.M. Chavez Boggio,D. Bodenmüller,T. Fremberg,Roger Haynes,Markus Roth,René Eisermann,Marco Lisker,Lars Zimmermann,Michael Böhm +8 more
TL;DR: In this paper, the authors investigated the dispersion engineering in silicon nitride (SiXNY) waveguides through the optimization of the waveguide transversal dimensions and refractive indices in a multicladding arrangement.
Journal ArticleDOI
Metal-Free CVD Graphene Synthesis on 200 mm Ge/Si(001) Substrates
Mindaugas Lukosius,Jarek Dabrowski,Julia Kitzmann,O. Fursenko,Fatima Akhtar,Marco Lisker,Gunther Lippert,Sebastian Schulze,Yuji Yamamoto,M. A. Schubert,H. M. Krause,André Wolff,Andreas Mai,Thomas Schroeder,Grzegorz Lupina +14 more
TL;DR: Good quality, complementary-metal-oxide-semiconductor (CMOS) technology compatible, 200 mm graphene was obtained on Ge(001)/Si(001) wafers and it was revealed that the lack of interfacial oxide correlates with superior properties of graphene.