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B. G. Chae
Researcher at Electronics and Telecommunications Research Institute
Publications - 9
Citations - 735
B. G. Chae is an academic researcher from Electronics and Telecommunications Research Institute. The author has contributed to research in topics: Phase (matter) & Mott transition. The author has an hindex of 6, co-authored 9 publications receiving 692 citations.
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Observation of Mott Transition in VO_2 Based Transistors
TL;DR: An abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT near a critical on-site Coulomb energy U/U_c=1 was observed for the first time in VO_2, a strongly correlated material, by inducing holes of about 0.018% into the conduction band as mentioned in this paper.
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Observation of First-Order Metal-Insulator Transition without Structural Phase Transition in VO_2
Yong-Sik Lim,Hyun-Tak Kim,B. G. Chae,Doo-Hyeb Youn,K. O. Kim,Kwang-Yong Kang,Shin Jung C. Lee,Kwan Kim +7 more
TL;DR: In this paper, an abrupt first-order metal-insulator transition (MIT) without structural phase transition is first observed by current-voltage measurements and micro-Raman scattering experiments, when a DC electric field is applied to a Mott insulator VO_2 based two-terminal device.
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Characteristics of W- and Ti-Doped VO2 Thin Films Prepared by Sol-Gel Method
TL;DR: In this paper, W and Ti-doped thin films were deposited onto sapphire by the sol-gel method, and they were grown with (020)-preferred direction.
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Phase coexistence in the metal–insulator transition of a VO2 thin film
Young Jun Chang,C.H. Koo,J.S. Yang,Youn-hwan Kim,Dai Hong Kim,J Lee,Tae-Hee Noh,Hyun-Tak Kim,B. G. Chae +8 more
TL;DR: In this article, the authors used scanning tunneling spectroscopy (STS) spectra to distinguish metallic and insulating regions by probing the band gap of VO2 thin films.
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Growth optimization and electrical characteristics of VO2 films on amorphous SiO2/Si substrates
TL;DR: In this paper, the growth conditions of VO2 films on amorphous SiO2/Si structure substrates by pulsed laser deposition were optimized to achieve a change in resistivity of the order of 102 near a critical temperature.