https://www.diva-portal.org/smash/get/diva2:17175/FULLTEXT02

Ionized physical vapor deposition (IPVD): A review of technology and applications

Structure and properties of TiN coatings

Reactive-sputter-deposited TiN films on glass substrates

Metastable single‐phase, NaCl‐structure, polycrystalline Ti0.5Al0.5N alloy films have been shown to exhibit much better high‐temperature (750–900 °C) oxidation resistance than polycrystalline TiN films grown under similar conditions. The Ti0.5Al0.5N alloys, ≂3 μm thick, were deposited at temperatures between 400 and 500 °C on stainless‐steel substrates by dc magnetron sputter deposition in mixed Ar+N2 discharges with an applied negative substrate bias Vs of either 0 or 150 V. Oxidation in pure O2 initially occurred at a rate that varied parabolically with time. The oxide overlayers consisted of two partially crystalline sublayers, the upper one Al‐rich and the lower one Ti‐rich, with no measurable N concentrations in either. Inert‐marker transport experiments showed that oxidation proceeded by the simultaneous outward diffusion of Al to the oxide/vapor interface and inward diffusion of O to the oxide/nitride interface. The oxidation rate constant K increased with oxidation temperature Tox at a rate much h...

Oxidation of metastable single‐phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms

Supertough wear-resistant coatings with ‘chameleon’ surface adaptation

Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure

Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

The adhesion is of vital importance for the performance of tools coated with titanium nitride. In view of this, we have studied the effects of substrate temperature and pretreatment on the adhesion of TiN coatings. Since high‐speed steels are among the most used substrate materials for tool applications we have chosen to deposit the films onto eight different high speed steels. The TiN coatings were deposited using reactive dc‐magnetron sputtering, and the adhesion was measured using the scratch test. In order to study the film–substrate interface Auger electron spectroscopy was used in combination with ion beam depth profiling. On most of the steels, the adhesion of the films increased with substrate temperature, reaching a maximum between 400 and 500 °C. The increased adhesion is associated with changes in the oxide layer on the steel substrate. As the temperature increases, Fe2O3 and F3O4 decompose to FeO. Sputter etching of the substrate prior to deposition improves the film adhesion even though a com...

B.-O. Johansson

Papers

Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure

Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

Adhesion of titanium nitride coatings on high‐speed steels

Mechanisms of reactive sputtering of titanium nitride and titanium carbide III: Influence of substrate bias on composition and structure

Kinetics of nitride formation on titanium targets during reactive sputtering