J
J.-E. Sundgren
Researcher at Linköping University
Publications - 94
Citations - 6754
J.-E. Sundgren is an academic researcher from Linköping University. The author has contributed to research in topics: Sputtering & Thin film. The author has an hindex of 39, co-authored 94 publications receiving 6475 citations.
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Structure and properties of TiN coatings
TL;DR: In this article, the microstructures of thin films of TiN are reviewed and correlated to physical properties such as the electrical resistivity and the hardness of the films, and the origin of the various micro-structures that are obtained is also discussed in terms of the growth conditions used.
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Oxidation of metastable single‐phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms
TL;DR: In this article, the authors used dc magnetron sputter deposition in mixed Ar+N2 discharges with an applied negative substrate bias of either 0 or 150 V. The oxide overlayers consisted of two partially crystalline sublayers, the upper one Al-rich and the lower one Ti-rich.
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Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering
TL;DR: The preferred orientation of polycrystalline TiN films grown by ultrahigh-vacuum reactive magnetron sputter deposition on amorphous SiO2 at 350°C in pure N2 discharges was controllably varied from (111) to completely (002) by varying the incident ion/metal flux ratio Ji/JTi from 1 to ≥5 with the N+2 ion energy Ei maintained constant at ≂20 eV (≂10 eV per incident accelerated N) as mentioned in this paper.
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Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure
TL;DR: In this paper, the properties of carbide and nitride films were characterized by scanning electron microscopy and X-ray diffraction and through measurements of the microhardness and electrical resistivity.
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Nanoindentation studies of single‐crystal (001)‐, (011)‐, and (111)‐oriented TiN layers on MgO
TL;DR: In this paper, the mechanical properties of (001), (011) and (111) oriented MgO wafers and 1μm-thick TiN overlayers, grown simultaneously by dc magnetron sputter deposition at 700 °C in a mixed N2 and Ar discharge, were investigated using nanoindentation.