Journal ArticleDOI
Mechanisms of reactive sputtering of titanium nitride and titanium carbide III: Influence of substrate bias on composition and structure
TLDR
In this paper, the authors measured the compositions of the films using Auger electron spectroscopy and their structure and morphology studied using X-ray diffraction and scanning electron microscopy respectively.About:
This article is published in Thin Solid Films.The article was published on 1983-07-29. It has received 116 citations till now. The article focuses on the topics: Titanium nitride & Biasing.read more
Citations
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Journal ArticleDOI
Structure and properties of TiN coatings
TL;DR: In this article, the microstructures of thin films of TiN are reviewed and correlated to physical properties such as the electrical resistivity and the hardness of the films, and the origin of the various micro-structures that are obtained is also discussed in terms of the growth conditions used.
Journal ArticleDOI
Microstructure modification of TiN by ion bombardment during reactive sputter deposition
TL;DR: In this article, cross-sectional transmission electron microscopy has been used to investigate the effects of low energy (400 eV or less) ion irradiation during the growth of reactively sputtered TiN at temperatures between 300 and 900 °C.
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Investigation of reactively sputtered TiN films for diffusion barriers
TL;DR: In this article, two groups of reactively sputtered TiN films, gold-yellow films (G films) with low resistivity and high compressive internal stress and brown-black films (B films), which are formed with and without a negative substrate bias, were examined as potential diffusion barriers.
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Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings
TL;DR: In this paper, X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the coatings and confirmed the formation of superlattice structure at low modulation wavelengths, and the maximum hardness of the TiN/CrN multilayers was 3800kg/mm2 at?=80 A?, VB=-150V and T S=400xB0;C.
Journal ArticleDOI
High Temperature microhardness of hard coatings produced by physical and chemical vapor deposition
TL;DR: The microhardness of hard coatings of TiN and HfN prepared by chemical vapor deposition (CVD) and TiN, HfNs, ZrN and TiAlN were measured between room temperature and 1000°C as mentioned in this paper.
References
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Journal ArticleDOI
High Rate Thick Film Growth
TL;DR: In this paper, a review of the physical vapor deposition (PVD) of thin films is presented, focusing mainly on evaporation and sputtering processes and the physics of their growth and structure.