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Brajendra Mishra
Researcher at Colorado School of Mines
Publications - 116
Citations - 1804
Brajendra Mishra is an academic researcher from Colorado School of Mines. The author has contributed to research in topics: Corrosion & Dielectric spectroscopy. The author has an hindex of 22, co-authored 104 publications receiving 1547 citations. Previous affiliations of Brajendra Mishra include Worcester Polytechnic Institute.
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The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering
TL;DR: In this paper, the time averaged ion energy distributions and ion fluxes of continuous dc magnetron sputtering (dcMS), middle frequency pulsed DC magnetron (PMS), and modulated pulse power (MPP) plasmas were compared during sputtering of a Cr target in an Ar/N 2 atmosphere in a closed field unbalanced magnetron system.
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Rare-Earth Economics: The Balance Problem
TL;DR: The Center for Resource Recovery & Recycling (CR3) as discussed by the authors is a research center established by Worcester Polytechnic Institute, Colorado School of Mines, and KU Leuven.
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The structure and mechanical and tribological properties of TiBCN nanocomposite coatings
TL;DR: In this article, a closed field unbalanced magnetron sputtering system was used to evaluate the superhardness of nanocomposite coatings with a nitrogen content of less than 8.%.
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CrN/AlN superlattice coatings synthesized by pulsed closed field unbalanced magnetron sputtering with different CrN layer thicknesses
TL;DR: In this article, a pulsed closed field unbalanced magnetron sputtering system was used to synthesize a single phase face-centered cubic structure with well defined interfaces between CrN and AlN nanolayers.
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Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS)
TL;DR: In this paper, an electrostatic quadrupole plasma mass spectrometer (EQP) has been used in a pulsed closed unbalanced magnetron sputtering (P-CFUBMS) system to investigate the effect of different pulsing parameters (frequency and reverse time) on the ion energies and ion fluxes in the intrinsic plasma during Cr-Al-N film deposition.