C
Christian Lund Rasmussen
Researcher at Technical University of Denmark
Publications - 13
Citations - 899
Christian Lund Rasmussen is an academic researcher from Technical University of Denmark. The author has contributed to research in topics: Partial oxidation & NOx. The author has an hindex of 9, co-authored 13 publications receiving 764 citations.
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Global Combustion Mechanisms for Use in CFD Modeling under Oxy-Fuel Conditions
TL;DR: In this article, two global multistep schemes, the two-step mechanism of Westbrook and Dryer (WD) and the four-stage mechanism of Jones and Lindstedt (JL), have been refined for oxy-fuel conditions.
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Experimental measurements and kinetic modeling of CO/H2/O2/NOx conversion at high pressure
TL;DR: In this paper, experimental measurements and kinetic modeling of CO/H₂/O/O₆/NO conversion at high pressure were used to investigate the effect of high pressure on CO 2.
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Sensitizing effects of NOx on CH4 oxidation at high pressure
TL;DR: In this article, the authors investigated the sensitizing effect of NOx on CH4 oxidation at high pressures and medium temperatures in a laboratory-scale high pressure laminar flow reactor, where experiments were conducted at 100, 50, and 20 bar, 600-900 K and stoichiometric ratios ranging from highly reducing to oxidizing conditions.
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Mechanisms of Radical Removal by SO2
TL;DR: In this paper, the authors showed that the interaction of SO 2 with the radical pool is more complex than previously assumed, involving HOSO and SO, as well as, at high temperatures also HSO, SH, and S.
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Experimental and Kinetic Modeling Study of C2H4 Oxidation at High Pressure
Jorge Gimenez Lopez,Jorge Gimenez Lopez,Christian Lund Rasmussen,María U. Alzueta,Yide Gao,Paul Marshall,Peter Glarborg +6 more
TL;DR: In this paper, a detailed chemical kinetic model for oxidation of C 2 H 4 in the intermediate temperature range and high pressure has been developed and validated experimentally, and the results indicate that at 60 bar and medium temperatures vinyl peroxide, rather than CH 2 O and HCO, is the dominant product.