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Christopher N. Pannell
Researcher at University of Kent
Publications - 91
Citations - 1481
Christopher N. Pannell is an academic researcher from University of Kent. The author has contributed to research in topics: Optical fiber & Brillouin scattering. The author has an hindex of 22, co-authored 91 publications receiving 1436 citations. Previous affiliations of Christopher N. Pannell include University of Southampton & Kent State University.
Papers
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Potential of stimulated Brillouin scattering as sensing mechanism for distributed temperature sensors
TL;DR: In this paper, it was demonstrated that stimulated Brillouin scattering (SBS) occurring in the core of an optical fiber can be used in the construction of a distributed temperature sensor.
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Transient response in high-resolution Brillouin-based distributed sensing using probe pulses shorter than the acoustic relaxation time
TL;DR: This study reveals the processes responsible for a broadening of the Brillouin loss curve when the probe pulse duration is reduced, followed by a sudden and rather surprising reduction of the linewidth when the pulse duration gets shorter than the acoustic relaxation time.
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Heat transfer modelling in CO2 laser processing of optical fibres
TL;DR: In this article, the diameter self-regulation of optical fiber tapers produced using a CO2 laser has been examined theoretically and modelled numerically, where the Mie theory of absorption derived from the Maxwell equations is used.
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Ultrasonic hydrophone based on short in-fiber Bragg gratings
Norman E. Fisher,David J. Webb,Christopher N. Pannell,David A. Jackson,Leonid R. Gavrilov,J.W. Hand,Leishi Zhang,Ian Bennion +7 more
TL;DR: The feasibility of using in-fiber Bragg gratings for measuring acoustic fields in the megahertz range is investigated and it is found that the acoustic coupling from the ultrasonic field to the grating leads to the formation of standing waves in the fiber.
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In situ monitoring of sputtered zinc oxide films for piezoelectric transducers
TL;DR: In this paper, a simple single layer model is used to predict the in situ ellipsometry measurement data for films deposited under optimum conditions, while a two layer model (duplex model) is needed to model the ellipsometric measurement data of rough films formed under conditions away from the optimum.