D
Dale L. Hetherington
Researcher at Sandia National Laboratories
Publications - 39
Citations - 2187
Dale L. Hetherington is an academic researcher from Sandia National Laboratories. The author has contributed to research in topics: Chemical-mechanical planarization & Polishing. The author has an hindex of 19, co-authored 39 publications receiving 2136 citations.
Papers
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Journal ArticleDOI
A three-dimensional photonic crystal operating at infrared wavelengths
Shawn-Yu Lin,James G. Fleming,Dale L. Hetherington,Bradley K. Smith,Rana Biswas,Kai-Ming Ho,Mihail M. Sigalas,W. Zubrzycki,Steven R. Kurtz,J. Bur +9 more
TL;DR: In this article, the authors constructed a 3D infrared photonic crystal on a silicon wafer using relatively standard microelectronics fabrication technology, which showed a large stop band (10−14.5μm), strong attenuation of light within this band (∼12 dB per unit cell) and a spectral response uniform to better than 1 per cent over the area of the 6-inch wafer.
Patent
Chemical-mechanical polishing of recessed microelectromechanical devices
TL;DR: In this paper, a method for micromachining recessed layers (e.g., sacrificial layers) of a microelectromechanical system (MEMS) device formed in a cavity etched into a semiconductor substrate is described.
A closed-form analytic model for ild thickness variation in cmp processes
B.E. Stine,Dennis Okumu Ouma,R. Divecha,Duane S. Boning,J. Chung,Dale L. Hetherington,Iqbal Ali,Gregory B. Shinn,J. Clark +8 more
TL;DR: This work develops and derives a closed form model for ILD thickness variation andifies this model on datasets obtained from different polishing tools, consumable sets, and process conditions, and as a function of polishing time.
Patent
Use of chemical-mechanical polishing for fabricating photonic bandgap structures
TL;DR: In this paper, a method for fabricating a two- or three-dimensional photonic bandgap structure (also termed a photonic crystal, photonic lattice, or photonic dielectric structure) is disclosed.
Journal ArticleDOI
Optical interferometry for surface measurements of CMP pads
TL;DR: In this article, an optical interferometer was used to quantitatively characterize the surface of chemical-mechanical polishing (CMP) pads used to polish oxide films.