D
David Pugh
Researcher at University College London
Publications - 19
Citations - 424
David Pugh is an academic researcher from University College London. The author has contributed to research in topics: Thin film & Chemical vapor deposition. The author has an hindex of 12, co-authored 19 publications receiving 375 citations.
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Single-source precursors to gallium and indium oxide thin films
TL;DR: A review of the literature concerning single-source precursors and the methods employed to deposit gallium and indium oxide thin films using these compounds is presented in this article, along with an update of the compounds which are potential single source precursor to these materials.
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Tantalum and Titanium doped In2O3 Thin Films by Aerosol-Assisted Chemical Vapor Deposition and their Gas Sensing Properties
Leanne G. Bloor,Joe A. Manzi,Russell Binions,Russell Binions,Ivan P. Parkin,David Pugh,Ayo Afonja,Christopher S. Blackman,Sanjayan Sathasivam,Claire J. Carmalt +9 more
TL;DR: In this paper, Tantalum doped indium oxide (In2O3:Ta) thin films were investigated on films deposited onto gas sensing substrates via aerosol assisted chemical deposition (AACVD) at 450 °C.
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An array of WO3 and CTO heterojunction semiconducting metal oxide gas sensors used as a tool for explosive detection
TL;DR: In this paper, an array of seven heterojunction semiconducting metal oxide sensors were tested against four gases associated with explosive materials, including nitrogen dioxide, ethanol, ammonia and nitromethane.
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The gas sensing properties of zeolite modified zinc oxide
TL;DR: In this paper, an array of four thick film metal oxide semiconducting (MOS) sensors was fabricated, based on zinc oxide inks, using a commercially available screen printer, a 3 × 3 mm alumina substrate containing interdigitated electrodes and a platinum heater track.
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Group 13 β-ketoiminate compounds: gallium hydride derivatives as molecular precursors to thin films of Ga2O3.
TL;DR: The β-ketoimine compounds have been used as single-source precursors for the deposition of Ga(2)O(3) by aerosol-assisted (AA)CVD with toluene as the solvent and varied according to the precursor used, with the complex [Ga(L(1))H] (8) giving by far the best quality films.