D
Don Schlosser
Publications - 2
Citations - 128
Don Schlosser is an academic researcher. The author has contributed to research in topics: Photolithography & Multiple patterning. The author has an hindex of 2, co-authored 2 publications receiving 127 citations.
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Proceedings ArticleDOI
PDL oxide enabled pitch doubling
Nader Shamma,Wen-Ben Chou,Ilia Kalinovski,Don Schlosser,Tom Mountsier,Collin Mui,Raihan Tarafdar,Bart van Schravendijk +7 more
TL;DR: In this article, the results of fabrication of sub-50nm features on a 100nm pitch by the PDL-spacer DP process using 0.85 NA dry ArF lithography are reported.
Journal ArticleDOI
Patterning with Amorphous Carbon Thin Films
George Andrew Antonelli,Sirish Reddy,Pramod Subramonium,Jon Henri,Jim Sims,Jennifer O'Loughlin,Nader Shamma,Don Schlosser,Tom Mountsier,Wei Guo,Herb Sawin +10 more
TL;DR: Amorphous carbon hard mask films grown with plasma enhanced chemical vapor deposition are an enabling technology for advanced front-end-of-line patterning technologies as mentioned in this paper, which can have a low etch rate and be weakly roughened in dielectric etch chemistries, high transparency at lithography alignment wavelengths, and mechanical properties to mitigate elastic instabilities such as line bending.