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Eberhard Manske
Researcher at Technische Universität Ilmenau
Publications - 87
Citations - 908
Eberhard Manske is an academic researcher from Technische Universität Ilmenau. The author has contributed to research in topics: Metrology & Lithography. The author has an hindex of 15, co-authored 67 publications receiving 754 citations.
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Recent developments and challenges of nanopositioning and nanomeasuring technology
TL;DR: In this article, a range of nanoprobe systems usable in nanomeasuring machines is discussed, such as optical focus sensors, white light interferometer microscopes, CCD camera microscopes using the depth from the focus method, tactile stylus probes, atomic force microscopes (AFMs) and 3D microprobes.
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Insights into the Crystallinity of Layer-Structured Transition Metal Dichalcogenides on Potassium Ion Battery Performance: A Case Study of Molybdenum Disulfide.
TL;DR: The performance of low and high-crystallized MoS2 is compared to show the function of crystallinity is dependent on the electrochemical mechanism, and is one of the best among the reported LS-TMDs in KIBs.
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Phase measurement of various commercial heterodyne He–Ne-laser interferometers with stability in the picometer regime
TL;DR: In this article, an advanced phase meter was developed at PTB to resolve displacements of a picometer with widely used commercially available heterodyne interferometers, which is capable of interpolating an optical fringe down into the picometer regime.
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Nanopositioning and nanomeasuring machine NPMM-200—a new powerful tool for large-range micro- and nanotechnology
TL;DR: In this article, a new nanopositioning and nanomeasuring machine NPMM-200 with a measuring range of 200mm × 200 mm × 25 mm, and a resolution of 0.02 nm was developed.
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Nanomeasuring and nanopositioning engineering
G. Jäger,Tino Hausotte,Eberhard Manske,H.-J. Büchner,Rostyslav Mastylo,Nataliya Dorozhovets,N. Hofmann +6 more
TL;DR: In this article, the authors describe traceable nanometrology based on a nanopositioning machine with integrated nanoprobes, which is used for various tasks, such as large area scanning probe microscopy, mask and wafer inspection, nanostructuring, biotechnology and genetic engineering as well as measuring mechanical precision workpieces, precision treatment and for engineering new material.