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Eiji Yagyu

Researcher at Mitsubishi Electric

Publications -  46
Citations -  478

Eiji Yagyu is an academic researcher from Mitsubishi Electric. The author has contributed to research in topics: Layer (electronics) & Avalanche photodiode. The author has an hindex of 10, co-authored 45 publications receiving 364 citations. Previous affiliations of Eiji Yagyu include Mitsubishi Electric Research Laboratories.

Papers
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Journal ArticleDOI

Emerging GaN technologies for power, RF, digital, and quantum computing applications: Recent advances and prospects

TL;DR: In this article, the authors provide a glimpse of future GaN device technologies and advanced modeling approaches that can push the boundaries of these applications in terms of performance and reliability, which is a key missing piece to realize the full GaN platform with integrated digital, power, and RF electronics technologies.
Patent

Optical fiber sensor

TL;DR: In this article, an optical fiber sensor measuring the refractive index of a medium with high sensitivity in a wide range is presented, where a Bragg grating is provided to allow light in a wavelength band in the clad propagation mode to enter the optical fiber.
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Mode-evolution-based polarization rotator-splitter design via simple fabrication process.

TL;DR: A mode-evolution-based polarization rotator-splitter built on InP substrate is proposed by combining a mode converter and an adiabatic asymmetric Y-coupler, which effectively converts the fundamental TM mode into the second order TE mode without changing the polarization of the fundamental TE mode.
Journal ArticleDOI

Degradation Mode Analysis on Highly Reliable Guardring-Free Planar InAlAs Avalanche Photodiodes

TL;DR: In this article, the authors presented the high reliability of the guardring-free planar InAlAs avalanche photodiode (APD) and its degradation mode analysis and estimated mean times to failures at 85 are 25, 100, and 22 million hours, respectively.
Journal ArticleDOI

Enhancement of Drain Current by an AlN Spacer Layer Insertion in AlGaN/GaN High-Electron-Mobility Transistors with Si-Ion-Implanted Source/Drain Contacts

TL;DR: In this paper, Si ion implantation doping was employed to solve the problem and successfully obtained a sufficiently low contact resistance equivalent to that of HEMT without an AlN spacer layer.