E
Errol Antonio C. Sanchez
Researcher at Applied Materials
Publications - 125
Citations - 2824
Errol Antonio C. Sanchez is an academic researcher from Applied Materials. The author has contributed to research in topics: Layer (electronics) & Silicon. The author has an hindex of 25, co-authored 125 publications receiving 2734 citations.
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Patent
Liquid precursor system
TL;DR: In this article, a precursor feed system for a semiconductor process is described, which provides improved flow control of a vaporized precursor material to a process chamber by improving flow characteristics of vaporized precursors carried by an inert gas.
Patent
Method for inter-chamber process
TL;DR: In this article, a method of processing a substrate is described, which includes removing a native oxide from a surface of the substrate, baking the substrate in a pre-treatment thermal chamber such that double atomic steps are formed on the surface of substrate, and forming an epitaxial layer on the substrate after the substrate is baked.
Patent
Methods for detection using optical emission spectroscopy
Zhu Zuoming,Martin A. Hilkene,Avinash Shervegar,Srivastava Surendra Singh,Moradian Ala,Lau Shu-Kwan Danny,Zhiyuan Ye,Choo Enle,Chang Flora Fong-Song,Marath Sankarathodi Bindusagar,Liu Patricia M,Errol Antonio C. Sanchez,Lin Jenny C,Nyi O. Myo,Schubert S. Chu +14 more
TL;DR: In this paper, an optical signal is delivered from the process chamber to an optical emission spectrometer (OES), which identifies emission peaks of photons, which corresponds to the optical intensity of radiation from the photons, to determine the concentrations of each of the precursor gases and reaction products.
Proceedings ArticleDOI
GaP source-drain SOI 1T-DRAM: Solving the key technological challenges
TL;DR: In this paper, the authors proposed a method to reduce the sheet and contact resistance of GaP source and drain using nickel alloying, which improved the ON-current of the GaP-SD transistor by an order and established the proper scalability behavior.
Patent
Verfahren zum Ablagern von Schichten mit reduzierter Grenzflächenverschmutzung
TL;DR: In this article, erfinderischen Verfahren konnen die Verschmutzung an der Grenzflache zwischen abgelagerten Schichten.