G
G. Srinivas
Researcher at National Aerospace Laboratories
Publications - 32
Citations - 449
G. Srinivas is an academic researcher from National Aerospace Laboratories. The author has contributed to research in topics: Coating & Sputter deposition. The author has an hindex of 9, co-authored 21 publications receiving 325 citations.
Papers
More filters
Journal ArticleDOI
Design and fabrication of spectrally selective TiAlC/TiAlCN/TiAlSiCN/TiAlSiCO/TiAlSiO tandem absorber for high-temperature solar thermal power applications
TL;DR: In this article, a new nanostructured tandem absorber was designed for high-temperature solar thermal power applications, which was deposited on stainless steel substrates using a four-cathode reactive direct current unbalanced magnetron sputtering system.
Journal ArticleDOI
An experimental investigation on the machining characteristics of Nimonic 75 using uncoated and TiAlN coated tungsten carbide micro-end mills
TL;DR: In this article, the machining characteristics and machinability of a nickel-based superalloy were investigated using uncoated and TiAlN-coated tungsten carbide micro-end mills.
Journal ArticleDOI
Review on the machining characteristics and research prospects of conventional microscale machining operations
TL;DR: The literature is filled with works done by researchers working in this domain this paper, and a significant contribution comes from the works which have been published during the period 1998-2014, which have primarily been on conventional and non-conventional micromachining techniques.
Journal ArticleDOI
Nanocrystalline TiN coatings with improved toughness deposited by pulsing the nitrogen flow rate
Satender Kataria,S.K. Srivastava,Praveen Kumar,G. Srinivas,Siju,Jakeer Khan,D.V. Sridhar Rao,Harish C. Barshilia +7 more
TL;DR: In this article, the nano-mechanical characterization of the TiN coatings was carried out using nanoindentation, nanoscratch and wear testing techniques, which revealed the nanocrystalline nature of the coatings with column size between 25 and 30 nm.
Journal ArticleDOI
Ar+H2 plasma etching for improved adhesion of PVD coatings on steel substrates
TL;DR: In this paper, the effect of plasma treatment on the substrate surface based upon the data obtained from X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FESEM) and atomic force microscopy was investigated.