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Gerhard Meyer

Researcher at IBM

Publications -  160
Citations -  15915

Gerhard Meyer is an academic researcher from IBM. The author has contributed to research in topics: Scanning tunneling microscope & Scanning probe microscopy. The author has an hindex of 58, co-authored 158 publications receiving 14532 citations. Previous affiliations of Gerhard Meyer include University of Regensburg & Free University of Berlin.

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Controlled manipulation of atoms and small molecules with a low temperature scanning tunneling microscope

TL;DR: In this article, a short review of the last five years on atomic scale manipulation investigations is presented, showing the application of these techniques as local analytic and synthetic chemistry tools with important consequences on surface structure research.
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Manipulation of the charge state of single Au atoms on insulating multilayer films.

TL;DR: This work shows charge-state manipulation of single Au adatoms on 2-11 monolayer (ML) thick NaCl films on Cu surfaces by attaching or detaching single electrons via the tip of an atomic force microscope (AFM).
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Scanning tunneling microscopy of adsorbates on insulating films. From the imaging of individual molecular orbitals to the manipulation of the charge state

Jascha Repp, +1 more
- 23 Sep 2006 - 
TL;DR: In this paper, the authors used a scanning tunneling microscope to study the electronic properties of single atoms and molecules that are electronically decoupled from the metallic substrate, such as ultrathin insulating films on metal substrates.
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Selective bond breaking of single iodobenzene molecules with a scanning tunneling microscope tip

TL;DR: In this paper, the threshold tunneling electron energies to break a single bond inside a polyatomic molecule can be determined by using I-V spectroscopy of single molecules, and it requires electron energies of 3.1±0.1 eV or higher to further disrupt the π ring.
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All-in-one static and dynamic nanostencil atomic force microscopy/scanning tunneling microscopy system

TL;DR: The nanostencil is a tool for resistless lithography as discussed by the authors, which allows the direct patterning of complex nanometer-sized structures composed of a wide range of materials in an ultrahigh vacuum environment.