H
Hai Wei
Researcher at Stanford University
Publications - 33
Citations - 1843
Hai Wei is an academic researcher from Stanford University. The author has contributed to research in topics: Carbon nanotube & Carbon nanotube field-effect transistor. The author has an hindex of 19, co-authored 33 publications receiving 1704 citations.
Papers
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Journal ArticleDOI
Carbon nanotube computer
Max M. Shulaker,Gage Hills,Nishant Patil,Hai Wei,Hong-Yu Chen,H.-S. Philip Wong,Subhasish Mitra +6 more
TL;DR: This experimental demonstration is the most complex carbon-based electronic system yet realized, and a considerable advance because CNTs are prominent among a variety of emerging technologies that are being considered for the next generation of highly energy-efficient electronic systems.
Journal ArticleDOI
Carbon Nanotube Robust Digital VLSI
TL;DR: Significant advances in design tools can enable robust and scalable CNFET digital VLSI circuits that overcome the challenges of the C NFET technology while retaining its energy-efficiency benefits.
Proceedings ArticleDOI
VMR: VLSI-compatible metallic carbon nanotube removal for imperfection-immune cascaded multi-stage digital logic circuits using Carbon Nanotube FETs
Nishant Patil,Albert Lin,Jie Zhang,Hai Wei,Kyle R. Anderson,H.-S. Philip Wong,Subhasish Mitra +6 more
TL;DR: In this paper, a new technique, VLSI-compatible metallic-CNT removal (VMR), overcomes metallic CNT challenges by combining layout design with CNFET processing.
Journal ArticleDOI
Linear increases in carbon nanotube density through multiple transfer technique.
Max M. Shulaker,Hai Wei,Nishant Patil,J. Provine,Hong-Yu Chen,Hon-Sum Philip Wong,Subhasish Mitra +6 more
TL;DR: Experimental results demonstrate that CNT density can be improved from 2 to 8 CNTs/ μm, accompanied by an increase in drain-source CNFET current from 4.3 to 17.4 μA/μm.
Journal ArticleDOI
Carbon nanotube circuit integration up to sub-20 nm channel lengths.
Max M. Shulaker,Jelle Van Rethy,Tony F. Wu,Luckshitha Suriyasena Liyanage,Hai Wei,Zuanyi Li,Zuanyi Li,Eric Pop,Georges Gielen,H.-S. Philip Wong,Subhasish Mitra +10 more
TL;DR: This work demonstrates the first very large scale integration (VLSI)-compatible approach to realizing CNFET digital circuits at highly scaled technology nodes, with devices ranging from 90 nm to sub-20 nm channel lengths.