H
Hakan Karaagac
Researcher at Istanbul Technical University
Publications - 43
Citations - 464
Hakan Karaagac is an academic researcher from Istanbul Technical University. The author has contributed to research in topics: Thin film & Band gap. The author has an hindex of 12, co-authored 41 publications receiving 370 citations. Previous affiliations of Hakan Karaagac include University of California, Davis & Bilkent University.
Papers
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Physical properties and heterojunction device demonstration of aluminum-doped ZnO thin films synthesized at room ambient via sol–gel method
TL;DR: In this paper, the authors reported the successful synthesis of aluminum doped ZnO (AZO) thin films on soda-lime glass, silicon and fluorine doped tin oxide (FTO) pre-coated glass substrates by using sol-gel deposition method at ambient condition.
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Thickness-dependent nonlinear absorption behaviors in polycrystalline ZnSe thin films
TL;DR: In this paper, the life time of localized defect states on grain boundary was found to be ~ 3 ns from ultrafast pump-probe spectroscopy for polycrystalline ZnSe thin films.
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Characterization of AgGa0.5In0.5Se2 thin films deposited by electron-beam technique
TL;DR: In this paper, annealing of AgGa0.5In 0.5Se2 thin films was carried out by energy dispersive x-ray analysis measurements and the results showed that the films were indium and gallium-rich but selenium-and slightly silver-deficient.
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Au/TiO2 nanorod-based Schottky-type UV photodetectors
Hakan Karaagac,Levent E. Aygun,Mehmet Parlak,Mohammad Ali Ghaffari,Necmi Biyikli,Ali Kemal Okyay +5 more
TL;DR: In this article, the Schottky nanorods were synthesized on fluorine-doped tin oxide (FTO) pre-coated glass substrates using hydrothermal growth technique.
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Enhanced Field Ionization Enabled by Metal Induced Surface States on Semiconductor Nanotips
Hakan Karaagac,M. Saif Islam +1 more
TL;DR: In this article, a dramatically enhanced ionization process and a device based on charged particle beams for which the geometrical and surface properties of the constituent semiconductor nanotips are engineered with controlled introduction of metallic impurities to realize close to three orders of magnitude reduction in the ionization electric-power strength are described.