scispace - formally typeset
H

Hakan Karaagac

Researcher at Istanbul Technical University

Publications -  43
Citations -  464

Hakan Karaagac is an academic researcher from Istanbul Technical University. The author has contributed to research in topics: Thin film & Band gap. The author has an hindex of 12, co-authored 41 publications receiving 370 citations. Previous affiliations of Hakan Karaagac include University of California, Davis & Bilkent University.

Papers
More filters
Journal ArticleDOI

Physical properties and heterojunction device demonstration of aluminum-doped ZnO thin films synthesized at room ambient via sol–gel method

TL;DR: In this paper, the authors reported the successful synthesis of aluminum doped ZnO (AZO) thin films on soda-lime glass, silicon and fluorine doped tin oxide (FTO) pre-coated glass substrates by using sol-gel deposition method at ambient condition.
Journal ArticleDOI

Thickness-dependent nonlinear absorption behaviors in polycrystalline ZnSe thin films

TL;DR: In this paper, the life time of localized defect states on grain boundary was found to be ~ 3 ns from ultrafast pump-probe spectroscopy for polycrystalline ZnSe thin films.
Journal ArticleDOI

Characterization of AgGa0.5In0.5Se2 thin films deposited by electron-beam technique

TL;DR: In this paper, annealing of AgGa0.5In 0.5Se2 thin films was carried out by energy dispersive x-ray analysis measurements and the results showed that the films were indium and gallium-rich but selenium-and slightly silver-deficient.
Journal ArticleDOI

Au/TiO2 nanorod-based Schottky-type UV photodetectors

TL;DR: In this article, the Schottky nanorods were synthesized on fluorine-doped tin oxide (FTO) pre-coated glass substrates using hydrothermal growth technique.
Journal ArticleDOI

Enhanced Field Ionization Enabled by Metal Induced Surface States on Semiconductor Nanotips

TL;DR: In this article, a dramatically enhanced ionization process and a device based on charged particle beams for which the geometrical and surface properties of the constituent semiconductor nanotips are engineered with controlled introduction of metallic impurities to realize close to three orders of magnitude reduction in the ionization electric-power strength are described.