H
Hans L. Hartnagel
Researcher at Technische Universität Darmstadt
Publications - 473
Citations - 5741
Hans L. Hartnagel is an academic researcher from Technische Universität Darmstadt. The author has contributed to research in topics: Schottky diode & Terahertz radiation. The author has an hindex of 35, co-authored 473 publications receiving 5475 citations. Previous affiliations of Hans L. Hartnagel include Darmstadt University of Applied Sciences & Chemnitz University of Technology.
Papers
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Journal ArticleDOI
Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering.
Stefan Facsko,Thomas Dekorsy,Clemens Koerdt,C. Trappe,Heinrich Kurz,Alexander Vogt,Hans L. Hartnagel +6 more
TL;DR: A formation process for semiconductor quantum dots based on a surface instability induced by ion sputtering under normal incidence is presented andCrystalline dots 35 nanometers in diameter and arranged in a regular hexagonal lattice were produced on gallium antimonide surfaces.
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Anodic Oxidation of GaAs in Mixed Solutions of Glycol and Water
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Three-Dimensional Finite-Difference Method for the Analysis of Microwave-Device Embedding
Andreas Christ,Hans L. Hartnagel +1 more
TL;DR: In this paper, a program package was developed to evaluate electromagnetic fields inside arbitrary transmission-line connecting structures and to compute the scattering matrix, and detailed results were given and discussed regarding the fundamental behavior of embedding.
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Passive-intermodulation analysis between rough rectangular waveguide flanges
Carlos Vicente,Hans L. Hartnagel +1 more
TL;DR: In this paper, a new model is presented for the calculation of passive intermodulation (PIM) in waveguide connections, which considers the roughness of interconnecting waveguide surfaces and the presence of an insulator layer (oxide and contaminants) on these metal surfaces.
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New anodic native oxide of GaAs with improved dielectric and interface properties
TL;DR: In this paper, a new method of forming an anodic native oxide of GaAs with excellent dielectric and interface properties is described, and the oxide is grown in a stable and reproducible manner in an electrolyte which is a suitable mixture of water, weak carboxylic acid (tartaric or citric acid), and polyhydric alcohol.