H
Hejun Du
Researcher at Nanyang Technological University
Publications - 23
Citations - 1274
Hejun Du is an academic researcher from Nanyang Technological University. The author has contributed to research in topics: Thin film & Diamond. The author has an hindex of 12, co-authored 23 publications receiving 1194 citations. Previous affiliations of Hejun Du include Massachusetts Institute of Technology.
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TiNi-based thin films in MEMS applications: a review
TL;DR: In this paper, some critical issues and problems in the development of TiNi thin films are discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, modeling of behavior as well as functionally graded or composite thin films.
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Characterization of TiNi shape-memory alloy thin films for MEMS applications
TL;DR: In this article, chemical composition, microstructure and phase transformation behaviors of sputter deposited NiNi films were studied using atomic force microscopy and scanning electron microscopy (SEM).
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Effects of film composition and annealing on residual stress evolution for shape memory TiNi film
Yong Qing Fu,Hejun Du +1 more
TL;DR: In this article, a co-sputtering of a Ti50Ni50 (at.%) target with a separated Ti target at a temperature of 723 K was performed on three types of thin Si films with different Ni/Ti ratios.
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SiC whisker toughened Al2O3-(Ti, W)C ceramic matrix composites
Yong Qing Fu,Y.W. Gu,Hejun Du +2 more
TL;DR: In this article, the effects of SiC whisker content and sintering temperature on the relative density, flexural strength and fracture toughness of Al2O3-(Ti, W) composites were investigated.
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Relaxation and recovery of stress during martensite transformation for sputtered shape memory TiNi film
Yong Qing Fu,Hejun Du +1 more
TL;DR: In this paper, the authors studied the residual stress, relaxation and recovery of stress during martensite transformation of the sputtering-deposited TiNi films and showed that a wide range of residual stress levels (both tensile and compressive) were obtained with the change of Ti contents in the deposited films.