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Henry O. Marcy

Researcher at Northwestern University

Publications -  47
Citations -  1605

Henry O. Marcy is an academic researcher from Northwestern University. The author has contributed to research in topics: Thin film & Chemical vapor deposition. The author has an hindex of 20, co-authored 47 publications receiving 1569 citations. Previous affiliations of Henry O. Marcy include Northwest University (United States).

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Redox Intercalative Polymerization of Aniline in V2O5 Xerogel. The Postintercalative Intralamellar Polymer Growth in Polyaniline/Metal Oxide Nanocomposites Is Facilitated by Molecular Oxygen

TL;DR: In this article, the role of oxygen in polyaniline insertion in V2O5·nH2O xerogel has been investigated, showing that oxygen acts as an electron acceptor both during the in situ reaction and long after intercalation is complete.
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In situ intercalative polymerization of pyrrole in FeOCl: a new class of layered, conducting polymer-inorganic hybrid materials

TL;DR: In this paper, a structural form of polypyrrole in which polymerization and intercalation of pyrrole are brought about within the constrained van der Waals gap of a layered inorganic solid (FeOCl) was reported.
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Conductive polymer/oxide bronze nanocomposites. Intercalated polythiophene in V2O5 xerogels

TL;DR: In this article, the same authors showed that the six-membered rings of the gallium compound Me2Ga(p-Sb-t-Bu2)I3 (2) have a distorted twist-boat conformation that is devoid of symmetry.
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Reaction of Aniline with FeOCl. Formation and Ordering of Conducting Polyaniline in a Crystalline Layered Host

TL;DR: A detailed study of the intercalative polymerization reaction of aniline with FeOCl, an extensive physicochemical and spectroscopic characterization of the products, and their oxidative behavior in air is presented in this paper.
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Organometallic chemical vapor deposition of high Tc superconducting films using a volatile, fluorocarbon-based precursor

TL;DR: In this article, the high Tc superconductor YBa2Cu3O7−δ has been prepared by organometallic chemical vapor deposition using the volatile metalorganic precursors Cu(acetylacetonate)2, Y(dipivaloylmethanate)3, and Ba(heptafluorodimethyloctanedionate), and with argon as a carrier gas and water vapor as a reactant, film growth rates of 10-30 nm/min are achieved.