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Herbert A. Will

Researcher at Glenn Research Center

Publications -  15
Citations -  1612

Herbert A. Will is an academic researcher from Glenn Research Center. The author has contributed to research in topics: Heat flux & Thermocouple. The author has an hindex of 8, co-authored 15 publications receiving 1553 citations.

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Production of large‐area single‐crystal wafers of cubic SiC for semiconductor devices

TL;DR: In this article, a reproducible process for growing a thick single-crystal layer of cubic SiC on a singlecrystal Si wafer by chemical vapor deposition is described, where a buffer layer, grown in situ, is used between the SiC and the Si substrate to minimize the effect of lattice mismatch.
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Growth of Diamond Seed Crystals by Vapor Deposition

TL;DR: In this paper, carbon was deposited on virgin, natural diamond powder from methane gas at 1050°C and 0.3 Torr. The deposits were identified as new diamond by chemical analysis, chemical etching, density measurements, x-ray and electron diffraction, microwave absorption, electron spin resonance, and visual observations.
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Thin-film thermocouples and strain-gauge technologies for engine applications

TL;DR: In this paper, the authors presented two advanced thin-film sensor technologies: strain gauges and thermocouples, which are sputter deposited directly onto the test articles and are only a few micrometers thick; the surface of the test article is not structurally altered and there is minimal disturbance of the gas flow over the surface.
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Low‐Temperature Solid‐State Phase Transformations in 2H Silicon Carbide

TL;DR: In this paper, the phase transformations taking place in 2H SiC single crystals at temperatures as low as 400 C were studied, where some crystals transformed to a structure with one-dimensional disorder along the crystal c axis.
Proceedings ArticleDOI

Advances in Thin Film Sensor Technologies for Engine Applications

TL;DR: In this article, the authors presented two advanced thin film sensor technologies: strain gauges and thermocouples, which are sputter deposited directly onto the test articles and are only a few micrometers thick; the surface of the test article is not structurally altered and there is minimal disturbance of the gas flow over the surface.