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Hirokazu Fukidome

Researcher at Tohoku University

Publications -  123
Citations -  1789

Hirokazu Fukidome is an academic researcher from Tohoku University. The author has contributed to research in topics: Graphene & Silicon. The author has an hindex of 22, co-authored 117 publications receiving 1595 citations. Previous affiliations of Hirokazu Fukidome include Agere Systems & Osaka University.

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Graphene-based devices in terahertz science and technology

TL;DR: Graphene is a one-atom-thick planar sheet of a honeycomb carbon crystal and its gapless and linear energy spectra of electrons and holes lead to nontrivial features such as giant carrier mobility and broadband flat optical response as discussed by the authors.
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Epitaxial graphene on silicon substrates

TL;DR: By forming an ultrathin (~100?nm) SiC film on Si substrates and by annealing it at ~1500?K in vacuo, few-layer graphene is formed on Si substrate as discussed by the authors.
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Adsorption of CO2 on Graphene: A Combined TPD, XPS, and vdW-DF Study

TL;DR: In this article, the adsorption of CO2 molecules on monolayer epitaxial graphene on a SiC(0001) surface at 30 K was investigated by temperature-programmed desorption and X-ray photoelectron spectroscopy.
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Raman-Scattering Spectroscopy of Epitaxial Graphene Formed on SiC Film on Si Substrate

TL;DR: By conducting a 1200°C vacuum annealing of a 3C-SiC(111) ultrathin film preformed on a Si(110) surface, Wang et al. as discussed by the authors succeeded in forming a graphene layer on a si substrate.
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Epitaxial Growth Processes of Graphene on Silicon Substrates

TL;DR: In this article, a detailed structural characterization of this graphene-on-silicon (GOS) material by Raman spectroscopy and transmission-electron microscopy was conducted to obtain insights into the impacts of process parameters on defect formation.